Monday Sept 20th 2021 | ||
15:00 | Opening | |
Session 01 | Small Pixels Session chair: David Stoppa (ams OSRAM) | |
15:12 R01 |
The-State-of-the-Art of CMOS Image Sensors Ziad Shukri, TechInsights Inc., Ottawa, Canada |
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15:18 R02 |
A 40/22nm 200MP Stacked CMOS Image Sensor with 0.61um Pixel Masayuki Uchiyama2, Geunsook Park1; Tomoyasu Tate1, Masashi Minagawa2, Shino Shimoyamada2, Zhiqiang Lin1, King Yeung1, Lien Tu1, Wu-Zang Yang3, Alan Hsiung1, Vincent Venezia1, Lindsay Grant1 1 OmniVision Technologies, Santa Clara, CA, USA 2 OmniVision Technologies Japan, Kanagawa, Japan 3 OmniVision Technologies Taiwan, Hsinchu, Taiwan |
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15:24 R03 |
0.64μm-pitch CMOS Image Sensor with Low Leakage Current of Vertical
Transfer Gate Dongmo Im, Jameyung Kim, Juhee Lee, Sungbong Park, Kwansik Cho, Hyunchul Kim, Chang-Rok Moon and Hyoung-Sub Kim Semiconductor R&D Center, Samsung Electronics Co., Republic of Korea. |
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15:30 R04 |
An application of sub-half-micron pixel with preserved color pixel
concept for next-generation color image acquisition Yuichiro Yamashita1, Yuichiro Yamashita1, Rihito Kuroda2,3, Shigetoshi Sugawa3, Dun Nian Yaung1 1 CMOS Image Sensor Division, Taiwan Semiconductor Manufacturing Company, Hsinchu, Taiwan, R.O.C. 2 Graduate School of Engineering, Tohoku University, Sendai, Japan, 3 New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan |
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15:36 R05 |
A study on modulation transfer function and signal-to-noise ratio for
Tetracell CMOS image sensors with sub-micrometer scale unit pixels Jae Ho Kim, Euiyoung Song, Kwanghee Lee, Bumsuk Kim, DaeKwan Kim,Uihui Kwon, Dae Sin Kim Samsung Electronics, Hwaseong, Korea, |
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15:42 R06 |
Performance Analysis of Two Low-Noise 0.8um Pixel Designs Leo Anzaigra, Jiaju Ma, Donald Hondongwa, Dexue Zhang, Saleh Masoodian Gigajot Technology Inc, 3452 E Foothill Blvd, Suite 360, Pasadena , CA 91107 |
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15:48 R07 |
Novel non metallic pixel isolation technology for high sensitivity in
CMOS image sensors with submicron pixels Hye Yeon Park1, Yunki Lee1, In-Sung Joe2, Boseong Kim1, Taehan Kim1, Jeongmin Bae1, Hyunseok Song1, Kwangmin Lee2, Minsung Heo2, Jinhyung Kim2, Jaehak Lee3, Jungho Park3, Hyunchul Kim2, Chang-Rok Moon2, Bumsuk Kim1, JungChak Ahn1, Duckhyun Chang1 1 System LSI Division, Samsung Electronics Co., Ltd 2 Samsung Electronics, Semiconductor R&D Center 3 Foundry Division, Samsung Electronics Co., Ltd, Korea, |
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15:54 | Break | |
Session 02 | Low Noise and Photon Counting Session chair: Assaf Lahav | |
16:00 R08 |
Time Domain Noise Analysis of Oversampled CMOS Image Sensors Boyd Fowler, Andreas Suess, Mathias Wilhelmsen and Liang Zuo OmniVision Technologies, Santa Clara, CA, USA |
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16:06 R09 |
Multi-Gate Source-Follower for Quanta Image Sensors (QIS) Wei Deng and Eric R. Fossum Thayer School of Engineering, Dartmouth College, NH, USA |
|
16:12 R10 |
Characterization of Random Telegraph Noises of MOSFET Subthreshold
Currents for a 40nm Process Calvin Yi-Ping Chao, Meng-Hsu Wu, Shang-Fu Yeh, Chi-Lin Lee, Yin Chin, Kuo-Yu Chou, and Honyih Tu Taiwan Semiconductor Manufacturing Company, Hsinchu, Taiwan, ROC |
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16:18 R11 |
A 124dB Dynamic-Range SPAD Photon Counting Image Sensor Using Subframe
Extrapolation Jun Ogi, Takafumi Takatsuka, Kazuki Hizu, Yutaka Inaoka, Hongbo Zhu, Yasuhisa Tochigi, Yoshiaki Tashiro, Fumiaki Sano, Yusuke Murakawa†, Makoto Nakamura†, Yusuke Oike Sony Semiconductor Solutions, †Sony Semiconductor Manufacturing |
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16:24 R12 |
Quanta Burst Photography Sizhuo Ma1, Shantanu Gupta1, Arin C. Ulku2, Claudio Bruschini2, Edoardo Charbon2, Mohit Gupta1 1 University of Wisconsin-Madison, USA 2 EPFL, Switzerland |
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16:30 R13 |
A 1-Transistor SPAD Quanta Image Sensor for High-Speed and Small-Pitch
Arrays M. Perenzoni, L. Parmesan, F. Acerbi Fondazione Bruno Kessler – Sensors and Devices, Trento, Italy |
|
16:36 R14 |
A Simple Monte Carlo Transport and Multiplication Simulation Method
for the Analysis of a SPAD with a Spherically Uniform Electric Field
Peak Edward Van Sieleghem1,2, Andreas Süss2,3, Gauri Karve2, Koen De Munck2, Chris Van Hoof1,2, Jiwon Lee2 1 KU Leuven, ESAT, Kasteelpark Arenberg 10, 3001 Leuven, Belgium 2 Imec, Kapeldreef 75, 3001 Leuven, Belgium 3 now at OmniVision Technologies, Santa Clara CA 95054, USA |
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16:42 | Break | |
Session 03 | Time-of-Flight Session chair: Boyd Fowler (OmniVision) | |
16:48 R15 |
A Reconfigurable QVGA/Q3VGA Direct Time-of-Flight 3D Imaging
System with On-chip Depth-map Computation in 45/40nm 3D-stacked
BSI SPAD CMOS David Stoppa1, Sargis Abovyan2, Daniel Furrer1, Radoslaw Gancarz1, Thomas Jessenig2, Robert Kappel2, Manfred Lueger2, Christian Mautner2, Ian Mills1, Daniele Perenzoni1, Georg Roehrer2, Pierre-Yves Taloud1 1 ams International AG, Eggstrasse 91, 8803 Rueschlikon, Switzerland 2 ams AG, Tobelbader Strasse 30, 8141 Premstaetten, Austria |
|
16:54 R16 |
Demodulation Contrast simulation for indirect Time-Of-Flight sensors
based on Fast Photo-Diode G. Mugny*§, P. Fonteneau†§, B. Rodrigues-Goncalves†, J.M. Melo Santos‡, M. Vignetti†, C. Tubert∗, A. Crocherie†, D. Rideau†, F. Lalanne†, V. Farys† and A. Tournier† ∗ STMicroelectronics, Grenoble, France † STMicroelectronics, Crolles, France ‡ STMicroelectronics, Edinburgh, Scotland, UK |
|
17:00 R17 |
A 3-Tap Global Shutter 5.0um Pixel with Background Canceling for
165MHz Modulated Pulsed Indirect Time-of-Flight Image Sensor Masafumi Tsutsui1, Toshifumi Yokoyama1, Takahisa Ogawa1, Ikuo Mizuno1, Nobuyoshi Takahashi1, C. Ma2, F. Wang3, J. Debondt4, J. Bogaerts4, X. Wang2 & Assaf Lahav5 1 Tower Partners Semiconductor Co. Ltd., Toyama, Japan 2 Gpixel INC, Changchun, China 3 Orbbec Shenzhen, Shenzhen, China 4 Gpixel NV, Antwerp, Belgium 5 Tower Semiconductor, Migdal Haemek, Israel |
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17:06 R18 |
A 4-tap Lock-in Pixel Time-of-Flight Range Imager with Substrate
Biasing and Double-Delta Correlated Multiple Sampling Keita Yasutomi, Michihiro Inoue, Shohei Daikoku, Mars Kamel, Shoji Kawahito Research Institute of Electronics, Shizuoka University, Hamamatsu, 432-8011, Japan |
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17:12 R19 |
CMOS 3D-Stacked FSI Multi-Channel Digital SiPM for Time-of-Flight
Vision Applications Francesco Gramuglia1, Andrada Muntean1, Esteban Venialgo1, Myung-Jae Lee1, Scott Lindner1, Makoto Motoyoshi2, Andrei Ardelean1, Claudio Bruschini1, Edoardo Charbon1 1 EPFL, Neuchâtel, Switzerland 2 T-Micro, Sendai, Japan |
|
17:18 R20 |
An Ultra-low current operating 5-um Vertical Field Modulator Pixel for
in-direct Time of Flight 3D Sensor Jaehyung Jang1, Hoonmoo Choi1, Hyungjune Yoon1, Jongchae Kim1, Jongeun Kim1, Dongjin Lee1, Jaewon Lee1, Ohjun Kwon1, Jungen Song1, Minseok Shin1, Kangbong Seo1 1 SK hynix, Future Innovation Technology Group, Icheon-si, Gyeonggi-do, Korea |
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17:24 R21 |
Wiggling error self-calibration for indirect ToF image sensors Min-Sun Keel, Daeyun Kim, Jiheon Park, Sooho Son, Bumsik Chung, Jonghan Ahn, Yeomyung Kim, Myunghan Bae, Hoyong Lee, Myoungoh Ki, Myeonggyun Kye, Il-Pyeong Hwang, Seung-Chul Shin, Young-Gu Jin, Youngsun Oh, Yitae Kim, Jesuk Lee and Duckhyun Chang Samsung Electronics, Hwaseong, Korea |
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17:30 | Networking Lounge | |
Tuesday, Sept 21st 2021 | ||
15:00 | Opening remarks and announcements | |
Session 04 | Circuit Design of Pixels and Readout Circuits Session chair: Rihito Kuroda (Tohoku Univ.) | |
15:06 R22 |
A Partial-Multi-Conversion Single-Slope ADC with Response-Linearized
RDAC Akira Matsuzawa, Abdel Martinez Alonso, Lilan Yu, Minhyuk Sung, Masaya Miyahara Tech Idea Co., Ltd., Tamaku, Kawasaki, 214-0021, Japan |
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15:12 R23 |
A 200kFPS, 256×128 SPAD dToF sensor with peak tracking and smart
readout Istvan Gyongy1, Ahmet T. Erdogan1, Neale A.W. Dutton2, Hanning Mai1, Francesco Mattioli Della Rocca 1, Robert K. Henderson1 1 The University of Edinburgh, Institute for Integrated Micro and Nano Systems, Edinburgh, U.K., 2 Imaging Division, STMicroelectronics, Edinburgh, U.K. |
|
15:18 R24 |
A 13’000 FPS Vision System-on-Chip with Mixed-Signal Compressed
Sensing Jens Döge, Christoph Hoppe, Peter Reichel, Nico Peter, Andreas Reichel and Christian Skubich Fraunhofer Institute for Integrated Circuits IIS / EAS, Dresden, Germany |
|
15:24 R25 Presentation |
Unraveling the paradox of intensity-dependent DVS pixel noise Rui Graca, Tobi Delbruck Sensors Group, Inst. of Neuroinformatics, UZH-ETH Zurich, Zurich, Switzerland |
|
15:30 Withdrawn |
Energy Harvesting 3D Stacked Image Sensor with Integrated Data
Compression Filip Kaklin1,2, Jeffrey M. Raynor2, Robert K. Henderson1 1 School of Engineering, Institute for Integrated Micro and Nano Systems, University of Edinburgh, Edinburgh, UK, 2STMicroelectronics Imaging Division, Edinburgh, UK |
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15:36 I1 |
Invited Presentation I Sensor Design Parameters Affecting Automotive Machine VisionGabriel Bowers, Mobileye, Israel |
Session 05 | Flash Paper Breakout Rooms – session 1 16:00 – 17:30 | |
P01 |
Continuous Triple Log Gaussian Dark Current in 3-Tap Indirect ToF
Sensors Takahiro Akutsu, Masanori Nagase and Takashi Watanabe Brookman Technology, Inc., Hamamatsu, Japan |
|
P02 |
Dark Current Model for the Time of Low Noise & Photon Counting Dan McGrath GOODiX Technology, , Lexington, MA, USA |
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P03 |
Two-photon absorption in CMOS image sensors Daan Blommaert1, Guy Meynants1, and Stefano Guerrieri2 1 Dept. Electrical Engineering (ESAT), KU Leuven, Belgium 2 ams Sensors Belgium, Antwerp, Belgium |
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P04 |
A 5Mpix 5 um 140 fps MWIR Focal Plane Array and Readout Integrated
Circuit at 150K C.G. Jakobson, N. Ben Ari, W. Freiman, N. Shiloah, G. Zohar, T. Argov, O. Cohen, R. Dobromislin, R. Talmor, O. Magen, L. Shkedy, B. Milgrom, T. Markovitz, I. Shtrichman Semiconductor Devices, Haifa, Israel |
|
P05 |
Study on the Characteristics of Strain according to the dark effect in
1.12u Pixel Hoyoung Kwak1, Jongeun Kim1, Seongil Kim2, Kangbong Seo1 1 SK hynix, Future Innovation Technology Group, Icheon-si, Gyeonggi-do, Korea 2 SK hynix, AT Group, Cheongju-si, Chungcheongbuk-do, Korea |
|
P06 |
Impact of Kickback Noise of Comparator in Single Slope ADC on Photon
Transfer Curve Characterization Shang-Fu Yeh, Meng-Hsu Wu, Chih-Lin Lee, Chin Yin, Kuo-Yu Chou, Hon-Yih Tu, Calvin Yi-Ping Chao Taiwan Semiconductor Manufacturing Company, Hsinchu, Taiwan |
|
P07 |
Low-noise and high-performance 3-D pixel transistor for sub-micron
CMOS image sensors applications Sung-in Kim, Sungbong Park, Jongeun Park, Hyunchul Kim, Chang-Rok Moon and Hyoung- Sub Kim Semiconductor R&D Center, Samsung Electronics Co., Republic of Korea |
|
P08 |
Towards a High-Speed Photon-Counting CMOS Quanta Image Sensor (QIS) Wei Deng and Eric R. Fossum Thayer School of Engineering, Dartmouth College, Hanover, NH, USA |
|
P09 |
Modeling, Characterization and Simulation of Dielectric
Absorption in Capacitors in Image Sensors Manuel Innocent ON Semiconductor, Mechelen, Belgium |
|
P10 |
Improvement of Fluorine to Photo Response Non-Uniformity and Random
Telegraph Signal of Pinned Photodiodes Wen-Cheng Yen, Han-Chi Liu, and Sen-Huang Huang PixArt Imaging Inc., Hsinchu, Taiwan, ROC |
|
P11 |
Plasmonic diffraction for the sensitivity enhancement of silicon image
sensor Atsushi Ono1,2, Kazuma Hashimoto1, and Nobukazu Teranishi2,3 1 Graduate School of Integrated Science and Technology, Shizuoka University, Hamamatsu Japan 2 Research Institute of Electronics, Shizuoka University, Hamamatsu, Japan 3 Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Hyogo Japan |
|
P12 |
Indirect-ToF system optimization for sensing range enhancement with
patterned light source and optimal binning Seung-chul Shin, Myeonggyun Kye, Il-pyeong Hwang, Taemin An, Kyu-Min Kyung, Duhyeon Kwak, Hakbeom Jang, Hogyun Kim, Jaeil An, Sunhwa Lee, Yundong Chang, Seongwon Jo, Junghwan Yoo, Myoungoh Ki, Min-Sun Keel, Yitae Kim, Jesuk Lee and Duckhyun Chang Samsung Electronics, Hwaseong, Korea |
|
P13 |
A hardware and simulation-based framework for design of SPAD receivers
in scanning LiDAR systems Sarrah M. Patanwala1, 2, Hanning Mai1, Alistair Gorman1, Andreas Aßmann2, Istvan Gyongy1, Neale A. W. Dutton2, Bruce R. Rae2, and Robert K. Henderson1 1 School of Engineering, Institute for Integrated Micro and Nano Systems, University of Edinburgh, UK, 2STMicroelectronics Imaging Division, Edinburgh, UK |
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P14 |
Planar microlenses applied to SPAD pixels L. Dilhan1,2, J. Vaillant2, Q. Abadie2, A. Ostrovsky1, S. Verdet2, P. Calka2, F. Hemeret2, L. Masarotto2 1 STMicroelectronics, Crolles; France, 2 Univ. Grenoble Alpes, CEA, LETI, Grenoble, France |
|
P15 |
Innovating CMOS pixel potentials and Full Well Capacity extraction
methods from test structures. C.Doyen1,2, S.Ricq1, O.Marcelot2, P.Magnan2 1 STMicroelectronics, Crolles, France 2 ISAE-SUPAERO, Université de Toulouse, Toulouse, France |
|
P16 |
A 1.3M Pixel 34,700fps Global-Shutter BSI Imager with HDR and Motion
Blur Suppression Capability Gaozhan Cai1, Arno Van Hoorebeeck1, Bert Luyssaert1, Bart Dierickx1, Canol Gokel1, Tom Van Uffelen1, Periklis Stampoglis1, Gerlinde Ruttens1, Jun Yamane2, Kenji Tajima2, Idaku Ishii31 Caeleste CVBA, Mechelen, Belgium 2 Photron Limited, Tokyo, Japan 3 Hiroshima University, Department of System Cybernetics, Hiroshima, Japan |
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Wednesday, Sept 22st 2021 | ||
15:00 | Opening remarks and announcements | |
Session 06 | Optical Optimization of Pixels Session chair: Calvin Yi-Ping Chao (TSMC) | |
15:06 R27 |
A Smart Dual Pixel Technology for Accurate and All-Directional Auto
Focus in CMOS Image Sensors Kyungho Lee, Eun Sub Shim, Junghyung Pyo, Wooseok Choi, Jungbin Yun, Taesub Jung, Kyungduck Lee, Seyoung Kim, Chanhee Lee, Seungki Baek, Junseok Yang, Jongwon Choi, Bumsuk Kim, Chang-Rok Moon, JungChak Ahn, and Duckhyun Chang Samsung Electronics Co., Ltd., Hwaseong-city, Gyeonggi-do, Korea |
|
15:12 R28 Presentation |
A Compressed N×N Multi-Pixel Imaging and Cross Phase-Detection AF with
N×1RGrB+1×NGb Hetero Multi Pixel Image Sensors Koichi Fukuda ICB R&D Center 1, Canon Inc. Graduate School of Engineering, Tohoku University |
|
15:18 R29 |
Image sensor with V-shape deflector structures for sensor edge
performance improvement Shin-Hong Kuo, Ta-Yung Ni, Guang-Yu Huang, Huang-Jen Chen, Hui-Min Yang, Hao-Min Chen, Hao-Wei Liu, Yu-Chi Chang, Ching-Chiang Wu, Ken Wu, Hung-Jen Tsai VisEra Technologies Company, Hsinchu, Taiwan |
|
15:24 R30 |
Quantum Efficiency and Optical Cross-talk of Pixels with Backside
Scattering Technique for Near-Infrared Imaging Tae-Yon Lee, Seungjae Oh, Taehyoung Kim, Hongki Kim, Jihyun Kwak, Masaru Ishii, Surim Lee, Hyoju Kim, Yoonjay Han, Changhwa Kim, Jaehoon Jeon, Dongseok Cho, Seung Sik Kim, Jonghyun Go, In-Gyu Baek, Hyuksoon Choi, Jaekyu Lee, and Chang-Rok Moon Semiconductor R&D Center, Samsung Electronics Co.,Ltd., Gyeonggi-do, Korea |
|
15:30 R31 |
Novel Optical Fingerprint CMOS Image Sensor for Ultra-thin Module Yunki Lee1, Jonghoon Park1, Bumsuk Kim1, Junsung Park1, Bomi Kim1, Taehan Kim1, Yunji Jung1 ,Yunchul Han1, Seungjae Yoo1, Sungkwan Kim2, Junetaeg Lee2, Jesuk Lee1, Chang-Rok Moon3, Jungchak Ahn1, and Duckhyun Chang1 1 Samsung Electronics, System LSI Business, Yongin-si, Gyeonggi-do, Korea. 2 Samsung Electronics, Foundry Business, Yongin-si, Gyeonggi-do, Korea 3 Samsung Electronics, Semiconductor R&D Center, Hwasung-si, Gyeonggi-do, Korea. |
|
15:36 R32 |
1.4mm pixel, 8Mpixel, thick epi image sensor for RGB-IR imaging Orit Skorka, Stan Micinski, Andrew Perkins, Bob Gravelle, Xunzhi Li, and Radu Ispasoiu ON Semiconductor, Intelligent Sensing Group, USA |
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15:42 I2 |
Invited Presentation II EUV Lithography: driving worldwide innovation using advanced technology Wim van der Zande, ASML, The Netherlands |
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Session 07 | Flash Paper Breakout Rooms – Session 2 16:00 – 17:30 | |
P17 |
A 10-bit 10×10 25μm-Pixel NIR Camera Using Backside-illuminated
Ge-on-Si Detectors and Ultra-low-power Direct-injection ROICs Steffen Epple1, Zili Yu1, Mathias Kaschel1, Michael Oehme2, Maurice Warnitzek2, 1 Joerg Schulze2, Joachim N. Burghartz1 1 Institut für Mikroelektronik Stuttgart (IMS CHIPS), Stuttgart, Germany 2 Institut für Halbleitertechnik (IHT), Universität Stuttgart, Stuttgart, Germany |
|
P18 |
Development of an Advanced NIR Multispectral Technology Camera System
with Potential Industrial and Medical Innovative Applications Hirofumi Sumi1,2, Hironari Takehara1, and Jun Ohta1 1 Graduate School of Science and Technology, Nara Institute of Science and Technology (NAIST), Japan 2 Institute of Industrial Science, The University of Tokyo, Japan |
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P19 |
SPAD based Time of Flight Pixel Circuits for Large Scale Arrays Kasper Buckbee1,2, Neale Dutton2, Robert K. Henderson1 1 School of Engineering, Institute for Integrated Micro and Nano Systems, University of Edinburgh, Edinburgh, UK, 2 STMicroelectronics Imaging Division, Edinburgh, UK |
|
P20 |
A Novel Ultra-High-Speed CMOS Image Sensor Implementation with
Variable Spatial and Temporal Resolution using Temporal Pixel
Multiplexing Deividas Krukauskas, Ben Marsh, Iain Sedgwick, Nicola Guerrini, Seddik Benhammadi CMOS Sensor Design Group, Science and Technology Facilities Council (Now part of UK Research and Innovation), Rutherford Appleton Laboratory, Harwell Science and Innovation Campus, Didcot, Oxfordshire, United Kingdom |
|
P21 |
Charge Level Control with a Capacitive Trench for Imaging Devices P.Touron1, F.Roy1, P.Magnan2, C.Virmontois3 and S.Demiguel4 1 STMicroelectronics, Crolles, France 2 ISAE-Supaero, Université de Toulouse, Toulouse, France, 3 CNES, Toulouse, France, 4 Thales Alenia Space, Cannes, France |
|
P22 |
A rad-hard, 60µm pixel sensor optimized for the direct detection of
electrons M. Sanninoa, A. Bofill-Petita, M. Giulionia, A. Mollà Garciaa, and R. Turchettaa, G. McMullanb and R. Hendersonb, C. Copettic, B. Janssen, L Melec and G. van Duinenc a IMASENIC Advanced Imaging S.L., Barcelona, Spain b Laboratory of Molecular Biology, Cambridge, UK c ThermoFisher Scientific, Eindhoven, NL |
|
P23 |
A 1280 x 1024 Backside Illuminated CMOS Image Sensor with 0.75e-
noise, 25fps and 180mW Power Consumption Yang Liu1,2, Tao Jiang1, Jing Li1, Cheng Ma1, Quan Zhou1, Xinyang Wang1 1Gpixel INC, Changchun, China 2University of Chinese Academy of Sciences, Beijing, China |
|
P24 |
Characterization of Random Telegraph Signal Histogram according to
Floating Diffusion Potential in CMOS Image Sensor Dongho Ha, Hyungjun Han, Eun-Khwang Lee, Wonjun Lee, Dong Guk Lee, Gayoung Keum, Sieuoo Kim, Jiye Hwang, Hoon-Sang Oh, Changrock Song CIS Development Group, SK Hynix Inc., Icheon-si, Gyeonggi-do, Republic of Korea |
|
P25 |
A Multi-Simultaneous-Gate CMOS Lock-in Pixel Image Sensor for
Time-Resolved Near-Infrared Spectroscopy Lioe De Xing, Yuya Shirakawa, Keita Yasutomi, Keiichiro Kagawa, Shoji Kawahito Research Institute of Electronics, Shizuoka University |
|
P26 |
Depth precision in dToF sensors for AR applications Preethi Padmanabhan, Scott Lindner, Pierre-Yves Taloud, and David Stoppa ams International AG, Rueschlikon, Switzerland |
|
P27 |
A Multi-Junction Photodetector with Dual Four Transistor Structure to
Detect Visible and Near-infrared Light in One Single Pixel. Weihan Hu1 and Albert J. P. Theuwissen1,2 1 Electronic Instrumentation Laboratory, Delft University of Technology, Delft, The Netherlands, 2 Harvest Imaging, Bree, Belgium |
|
P28 Presentation |
On the covariance and variance in the determination of PTC Peter Centen1, Jeroen Rotte2 1 PeerImaging consulting, Goirle, The Netherlands 2 Grass Valley, Breda, The Netherlands |
|
P29 |
High-ambient, super-resolution depth imaging with a SPAD imager via
frame re-alignment Germán Mora-Martín1, Abderrahim Halimi2, Robert K. Henderson1, Jonathan Leach2, Istvan Gyongy1 1 The University of Edinburgh, Institute for Integrated Micro and Nano Systems, Edinburgh, U.K. 2 Heriot-Watt University, Institute of Photonics and Quantum Sciences, Edinburgh, U.K. |
|
P30 |
Dynamic Crosstalk Analysis for Branching Image Sensors Nguyen H. Ngo1, Takayoshi Shimura2, Taeko Ando1, Heiji Watanabe2, Kazuhiro Shimonomura1, Yoshinari Kamakura3, HidekiMutoh4,T. Goji Etoh1 1 Ritsumeikan University, Kusatsu, Shiga, Japan, 2 Osaka University, Osaka, Japan 3 Osaka Institute of Technology, Osaka, Japan 4 Link Research Corporation, Kanagawa, Japan |
|
P31 |
Threshold Uniformity Improvement in 1b QIS Readout Circuit Zhaoyang Yin1,2, Jiaju Ma2, Saleh Masoodian2 and Eric R. Fossum1 1Thayer School of Engineering, Dartmouth College, Hanover, NH, USA 2Gigajot Technology, Inc., Pasadena, CA, USA |
|
P32 |
5.6 μm charge domain global shutter pixel with 85dB shutter
efficiency Guy Meynants1,2, Martin Waeny1, Deyan Levski1, Rostislav Kandilarov1,Denis Sami1, Georgi Bochev1, Manlyun Ha3, WooSung Choi3, DongJun Oh3, SeongJin Kim3, YongChan Kim3 1 Photolitics, Ruse, Bulgaria 2 Dept. Electrical Engineering (ESAT), KU Leuven, Belgium 3 DB Hitek, Korea |
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Thursday, Sept 23th 2021 | ||
15:00 |
Opening remarks and announcements Best Flash Presentation Paper Award |
|
15:06 | Walter Kosonocky Award | |
Session 08 | High-Speed Imagers Session chair: Robert Henderson (Univ. Edinburgh) | |
15:12 R33 |
An Extremely High-Speed and Low-Power Digital Pixel Sensor with
Advanced Sensor Architecture Myunglae Chu, Min-Woong Seo, Suksan Kim, Hyun-Yong Jung, Jiyoun Song, Sung-Jae Byun, Minkyung Kim, Daehee Bae, Junan Lee, Sung-Yong Kim, Jongyeon Lee, Jonghyun Go, Jae-kyu Lee, Changrok Moon, Hyoung-Sub Kim Samsung Electronics, Hwaseong-si, Republic of Korea |
|
15:18 R34 |
Toward Super Temporal Resolution by Controlling Horizontal Motions of
Electrons T. Goji Etoh1,2, Nguyen Hoai Ngo2, Kazuhiro Shimonomura2, Taeko Ando2, Takayoshi Shimura1, Heiji Watanabe1, Hideki Mutoh3, Yoshinari Kamakura4, Edoardo Charbon5 1 Osaka University, 2 Ritsumeikan University, 3 Link Research Corp., 4 Osaka Inst. Tech., 5 EPFL |
|
15:24 R35 |
A 1000fps High SNR Voltage-domain Global Shutter CMOS Image
Sensor with Two-stage LOFIC for In-Situ Fluid Concentration
Distribution Measurements Tetsu Oikawa1, Rihito Kuroda1,2, Keigo Takahashi1, Yoshinobu Shiba2,3, Yasuyuki Fujihara1, Hiroya Shike1, Maasa Murata1, Chia-Chi Kuo1, Yhang Ricardo Sipauba Carvalho da Silva1, Tetsuya Goto2, Tomoyuki Suwa2, Tatsuro Morimoto2, Yasuyuki Shirai2, Masaaki Nagase3, Nobukazu Ikeda3, and Shigetoshi Sugawa2 1 Graduate School of Engineering, Tohoku University, Sendai, Miyagi, Japan 2 New Industry Creation Hatchery Center, Tohoku University, 3 Fujikin Incorporated |
|
15:30 R36 |
A 40000fps global shutter image sensor with 26.7ns 12-bit row readout
time A. Xhakoni, A. Fekri, P. Francis, K. Vancauwenbergh, K. Van Esbroeck AMS, Antwerp, Belgium |
|
15:36 R37 |
High speed 21Mpixel global shutter image sensor T. Blanchaert1, B. Ceulemans1, B. Wolfs1, W. Cotteleer1, G. Lepage1, G. Vanhorebeek1, E. Markey1, A. Huysman1, T. Jiang2, Y. Li2, C. Ma2, J. Bogaerts1 1 Gpixel NV, Antwerp, Belgium, 2Gpixel Inc, Changchun, China |
|
15:42 R38 |
A 1Mpixel, 80k fps Global Shutter CMOS Image Sensor for High Speed
Imaging Daniel Van Blerkom, Loc Truong, Jeff Rysinski, Radu Corlan*, Karthik Venkatesan, Sam Bagwell, Jonathan Bergey Forza Silicon, Pasadena, California, USA * Vision Research, Wayne, New Jersey, USA |
|
15:48 R39 |
A 2.5um 9.5 Mpixel charge domain global shutter imager with dual
columns and 7.1 Gbps per channel outputs for high framerate
applications Jeroen Rotte, Rik Visser, Ruud van Ree, Frank van der Weegen, Klaas Jan Damstra Grass Valley, Breda, the Netherlands |
|
15:54 | Break | |
Session 09 | Scientific and Non-Silicon Based Imagers Session chair: Preethi Padmanabhan (ams OSRAM) | |
16:00 R40 |
Detailed Characterization of SWIR-sensitive Colloidal Quantum Dot
Image Sensors Joo Hyoung Kim1, Vladimir Pejovic1,2, Epimitheas Georgitzikis1, Yunlong Li1, Pawel E. Malinowski1, Itai Liebermann1, David Cheyns1, Paul Heremans1,2, and Jiwon Lee1 1 imec, Leuven, Belgium, 2 KU Leuven, Leuven, Belgium |
|
16:06 R41 |
Crystalline Selenium Layer Stacked CMOS Image Sensors with Pixel-Wise
1-bit A/D Converters using Avalanche Multiplication Suitable for
Photon Counting Masahide Goto and Shigeyuki Imura NHK Science & Technology Research Laboratories, Tokyo, Japan, |
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16:12 R42 |
High-precision CMOS Proximity Capacitance Image Sensors with
Large-format 12μm and High-resolution 2.8μm Pixels Yuki Sugama1, Yoshiaki Watanabe1, Rihito Kuroda1,2, Masahiro Yamamoto1, Tetsuya Goto2, Toshiro Yasuda3, Shinichi Murakami3, Hiroshi Hamori3, Naoya Kuriyama4, and Shigetoshi Sugawa2 1 Graduate School of Engineering, Tohoku University,, Sendai, Miyagi, Japan 2 New Industry Creation Hatchery Center, Tohoku University, 3 OHT Inc., 4 LAPIS Semiconductor Co. Ltd. |
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16:18 R43 |
A 4k by 4k 8000fps large format event-based sparse readout direct
electron image sensor Peng Gao1, Benjamin Bammes2, Sampsa Veijalainen1, Jente Basteleus1, Gaozhan Cai1, Bert Luyssaert1, Bart Dierickx1, Robert Bilhorn2 1 Caeleste, Mechelen, Belgium, 2 Direct Electron LP, San Diego, CA, USA |
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16:24 R44 |
2×2-aperture 4-tap CMOS image sensor for multi-modal multi-band tissue
imaging with suppressing the ambient light and motion artifact Yuto Shimada, Kazuki Takada, Hoang Son Nam, Kakeru Miyazaki, Kohei Watanabe, Iori Shibata, Keita Yasutomi, Shoji Kawahito, Keiichiro Kagawa Shizuoka University, Japan |
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16:30 R45 |
A Time-Resolved 4-tap Image Sensor Using Tapped PN-Junction Diode
Demodulation Pixels Hiroaki Nagae1, Shohei Daikoku1, Keita Kondo1, Keita Yasutomi1,2, Keiichiro Kagawa1,2, Shoji Kawahito1,2 1Graduate School of Integrated Science and Technology, Shizuoka University, Hamamatsu, Japan 2Research Institute of Electronics, Shizuoka University, Hamamatsu, Japan |
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16:36 R46 |
A 500×500 Dual-Gate SPAD Imager with 100% Temporal Aperture and 1 ns
Minimum Gate Width for FLIM and Phasor Imaging Applications Arin Can Ulku, Andrei Ardelean, Paul Mos, Claudio Bruschini, Edoardo Charbon AQUA Laboratory, Ecole polytechnique fédérale de Lausanne (EPFL) |
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16:42 | Break |
Session 10 | Global Shutter and High Dynamic Range Imagers Session chair: Neale Dutton (ST Microelectronics) | |
16:48 R47 |
A 4.0μm Stacked Digital Pixel Sensor Operating in A Dual Quantization
Mode for Over 120dB Dynamic Range Kazuya Mori1,Naoto Yasuda1,Toshiyuki Isozaki1, Ken Miyauchi1, Isao Takayanagi1, Junichi Nakamura1, H.C.Chen2, Ken Fu2,SG.Wuu2, Andrew Berkovich3, Song Chen3, Wei Gao3 and Chiao Liu3 1 Brillnics Japan Inc., Tokyo, Japan 2 Brillnics Inc., Hsinchu, Taiwan 3 Facebook Reality Labs, Facebook Inc, Menlo Park, CA, USA |
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16:54 R48 |
Automotive 3 µm HDR Image Sensor with LFM and Distance
Functionality Sergey Velichko, Michael Guidash, Daniel Tekleab, Hung-Chih Chang, Manuel Innocent, Steve Nicholes, Denver Lloyd, Dave Jasinski, Andrew Perkins, Shaheen Amanullah, Maheedhar Suryadevara, Chris Silsby, Jeff Beck Intelligent Sensing Group, ON Semiconductor, USA |
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17:00 R49 |
4.0µm Stacked Voltage Mode Global Shutter Pixels with A BSI LOFIC and
A PDAF Capability Ken Miyauchi†, Kazuya Mori†, Toshiyuki Isozaki†, Yusuke Sawai†, Ho-Ching Chien‡ and Junichi Nakamura† †Brillnics Japan Inc., Tokyo, Japan ‡Brillnics Inc., Hsinchu, Taiwan |
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17:06 R50 |
A 12Mpixel 1.3” optical format CMOS HDR image sensor achieving
single-exposure flicker-free 90dB Dynamic range in GS shutter mode and
110dB Dynamic Range in 2-exposure ERS mode Parthasarathy Sampath+, Genis Chapinal*, Gurvinder Singh, Miten Odharia, Manuel Innocent, Tomas Geurts, Anirudh Oberoi, Rick Mauritzson, Chris Parks, John McCarten, Cristian Tivarus, Hung Doan, Neeraj Chouhan, Shreesha Gopalakrishna, Dan Pates, Igor Butinar, Rajashekar Benjaram +ON Semiconductor, Bangalore, India *ON Semiconductor, Mechelen, Belgium |
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17:12 R51 |
A 5.6µm Stacked Voltage Domain Global Shutter Pixel with 70ke- Linear
Full Well Capacity and 85dB Single Exposure High Dynamic Range Yusuke Sawai†, Toshiyuki Isozaki† , Naoto Yasuda†, Ken Miyauchi†, Ken Fu‡ and Kazuya Mori† †Brillnics Japan Inc., Tokyo, Japan ‡Brillnics Inc., Hsinchu, Taiwan |
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17:18 R52 |
A Double Transfer 8.0μm Pixel with High Conversion Gain and Pixel
Binning Ikuo Mizuno1, Masafumi Tsutsui1, Masayuki Nakamura1, Dmitri Ivanov2, Dmitry Veigner2 & Assaf Lahav2 1 Tower Partners Semiconductor Co., Ltd., Toyama, Japan 2 Tower Semiconductor Migdal Haemeq 23105, Israel |
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17:24 |
Best Student Paper Award Closing remarks |
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