9-14-2013 |
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2013 INTERNATIONAL IMAGE SENSOR WORKSHOP |
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Snowbird Resort, Utah,
USA |
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June 12-16, 2013 |
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PROGRAM |
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Wednesday June 12, 2013 |
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17:30-20:30 pm |
Reception |
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Thursday, June 13, 2013 |
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7:00 - 8:30 |
Breakfast |
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8:30 - 8:45 |
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Eric R. Fossum,
Co-Chair and President, IISS |
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Boyd Fowler, Co-Chair |
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Session 01 |
Pixel Technology Overview and Small Pixel
Sensors |
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Session chair: Nobukazu Teranishi (University
of Hyogo / Shizuoka University) |
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08:45 – 09:00 |
Innovative Technology Elements for
Large and Small Pixel CIS Devices |
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1.01 |
Ray Fontaine,
Technology Analysis Group, Chipworks, Inc. Ottawa,
Canada. |
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09:00 – 09:15 |
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1.02 |
Calvin Chao, Kuo-Yu Chou, Charles Liu, Yi-Che
Chen, Hon-Yih Tu, |
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Hsiu-Yu Cheng, Fu-Lung Hsueh,
and Shou-Gwo Wuu, |
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Taiwan Semiconductor
Manufacturing Company, Hsinchu, Taiwan. |
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09:15 – 09:30 |
Development of Lensed Color
Filter Technology for Higher SNR and Lower |
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1.03 |
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Hong-Ki Kim, Bumsuk Kim, Jung-Saeng Kim, *Jungkuk Park, Yooseung Lee, |
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Taesub Jung, Kyungho Lee, Heegeun Jung, Chang-Rok Moon, JungChak Ahn, |
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Goto Hiroshige, Chi-Young Choi and Duckhyung Lee; LSI Product & Technology, System |
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LSI Division, Samsung
Electronics Co., Ltd.; *Color Filter Technology Group, System LSI, |
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Division, Samsung
Electronics Co., Ltd, Yongin-City, Gyeonggi-Do, Korea. |
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09:30 – 09:45 |
Architecture and Development of
Next Generation Small BSI Pixels |
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1.04 |
H. Tian,
H. Komori, G. Agranov, J. Bai,
J. Hynecek, C. Baron, H-W. Lee, |
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X. Zhao, W. Gazeley, D. Tekleab, S. Nagaraja, W. Gao, P. Adepu, |
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V. Rajasekaran,
A. Rayankula, U. Boettiger,
M. Mooney, B. Vaartstra, |
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Aptina Imaging, San
Jose, CA, USA. |
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09:45 – 10:10 |
Break |
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Session 02 |
Imaging Process and Specialty Pixels |
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Session co-chairs: Shou-Gwo
Wuu (TSMC), Jungchak Ahn (Samsung) |
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10:10 – 10:25 |
Fundamental Ion Implantation
Technologies for Image Sensor Devices |
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2.01 |
G. Fuse, and M. Sugitani SEN Corporation, Saijo,
Japan. |
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10:25 – 10:40 |
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2.02 |
Jhy-Jyi Sze, R.J. Lin,
Seiji Takahashi, J.M. Hung, Y.C. Lu, T.H. Tseng, C.C. |
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Wang, S.F. Ting, and Shou-Gwo Wuu, Taiwan
Semiconductor Manufacturing |
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Company, Taiwan,
R.O.C. |
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10:40 – 10:55 |
Photolithographic
Solutions for Image Sensors with High Pixel Density |
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2.03 |
Ryo Sasaki, Yuhei Sumiyoshi, Yasuo Hasegawa
and Seiya Miura, Canon Inc., |
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Tochigi, Japan. |
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10:55 – 11:10 |
Dark Current Reduction in
Image Sensors through Metals Gettering: |
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2.04 |
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Venkataramana R. Chavva, Kyu-Ha Shim, and Todd Henry, Applied Materials.–. |
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Varian semiconductor
Equipment, Gloucester, MA, USA. |
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11:10 – 11:25 |
The DUV Stability of Superlattice-doped CMOS Detector Arrays |
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2.05 |
M. E. Hoenk, A. G. Carver, T. Jones, M. Dickie,
P. Cheng, F. Greer, S. Nikzad |
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(Jet Propulsion
Laboratory, California Institute of Technology, CA, USA), |
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J. Sgro
(Alacron, Inc., Nashua, NH, USA), S. Tsur (Applied Materials Inc., |
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Process, Diagnostics
& Control, Rehovot, Israel). |
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11:25 – 11:40 |
High Quantum Efficiency Back
Illuminated Photon Counting, Far UV, UV, |
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2.06 |
and Visible Detector Arrays
and their High Throughput Fabrication |
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Shouleh Nikzad, M. E. Hoenk, A. Carver, T.J. Jones, F. Greer, E. Hamden, and |
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T. Goodsall,
Jet Propulsion Laboratory, California Institute of Technology, USA. |
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11:40 – 13:10 |
Lunch |
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Session 03 |
Specialty Pixels and Application Specific
Imagers |
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Session chair: Daniel Van Blerkom
(Forza Silicon), |
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13:10 – 13:25 |
A 240x180 120dB 10mW 12us‐latency
Sparse Output Vision Sensor |
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3.01 |
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Raphael Berner, Christian Brandli, Minhao Yang, Shih-Chii Liu and |
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Tobi Delbruck, Inst.
of Neuroinformatics, University of Zurich and ETH
Zurich, |
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Zurich, Switzerland. |
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13:25 – 13:40 |
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3.02 |
Bart Dierickx, Stijn Vandewiele, Benoit Dupont,
Arnaud Defernez, Nick |
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Witvrouwen, Dirk Uwaerts, Caeleste, Antwerp, Belgium. |
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13:40 – 13:55 |
Fully Organic Integrated
Arrays on Flexible Substrates for X-Ray Imaging |
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3.03 |
Pawel E. Malinowski1, Abhishek Kumar2, Date J.D. Moet2,
David Cheyns1, |
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Barry P. Rand1,
Jan-Laurens P.J. van der Steen2, Kris Myny1, Soeren Steudel1, |
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Matthias Simon3,
Gerwin Gelinck2, and Paul Heremans1,2;
1IMEC, Leuven, Belgium; |
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2Holst Centre, Eindhoven, The Netherlands, 3Philips
Research, Eindhoven, |
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The Netherlands. |
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13:55 – 14:10 |
MEM-FLIM, a CCD Imager for
Fluorescence Lifetime Imaging Microscopy |
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3.04 |
Jan Bosiers, Harry van Kuijk, Wilco Klaassens, René Leenen, Willem Hoekstra, |
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Walter de Laat, Agnes Kleimann, Inge Peters, Jan Nooijen, Qiaole Zhao1, |
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Ian Ted, Young1,
Sander de Jong2, Kees Jalink3, Teledyne
DALSA Professional |
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Imaging, The
Netherlands, 1Delft University of Technology, Delft, NL; 2Lambert |
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Instruments, Roden, NL; 3Netherlands Cancer institute,
Amsterdam, NL. |
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14:10 – 14:25 |
A Direct-Detection X-Ray Cmos Image Sensor with 500 μm
Thick High |
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3.05 |
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T. Hatsui1,2,
M. Omodani2, T. Kudo1, K. Kobayashi1,2, T.
Imamura3,T. Ohmoto3, |
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A. Iwata3,S. Ono1,Y. Kirihara1,T. Kameshima2, H. Kasai4, N. Miura4,
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N. Kuriyama4,
M. Okihara5, Y. Nagatomo5, M. Nagasaki6, T.
Watanabe7, |
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Makina Yabashi1,2 , 1RIKEN
Spring-8 Center, 2JASRI, 3A-R-Tec Corp., |
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4LAPIS Semiconductor Miyagi Co.,
Ltd., 5LAPIS Semiconductor Co., Ltd., |
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6ARKUS Inc,
7University of Hyogo, Japan. |
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14:25 – 14:40 |
A FSI CMOS Image Sensor with
200-1000 nm Spectral Response and |
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3.06 |
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Rihito Kuroda, Shun Kawada, Satoshi Nasuno, Taiki Nakazawa, Yasumasa Koda, |
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Katsuhiko Hanzawa and Shigetoshi Sugawa, Graduate School of Engineering, |
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Tohoku University,
Miyagi, Japan. |
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14:40 – 15:05 |
Break |
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Session 04 |
Noise. |
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Session chair: Tetsuo Nomoto
(SONY) |
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15:05 – 15:20 |
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4.01 |
Boyd Fowler, Dan
McGrath, and Peter Bartkovjak, BAE Systems Imaging |
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Solutions, Milpitas,
CA 95035 USA. |
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15:20 – 15:35 |
Novel Device with Ultra Low
Noise for Smaller CMOS Image Sensor Pixel |
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4.02 |
T.H. Hsu, Shou-Gwo Wuu, D.N. Yaung, J.C. Liu, H.H. Tseng, W.D. Wang, |
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W.C. Hsu, W.I. Hsu,
T.J. Wang, Y.L. Tu, C.S. Tsai, W.P. Mo, C.E. Chen |
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Taiwan Semiconductor
Manufacturing Company, Tainan, Taiwan, R.O.C. |
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15:35 – 15:50 |
New Model of Dark Fixed Pattern
Noise Generation in CMOS Imager |
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4.03 |
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H. Sasaki, Y. Higashi,
H. Yamashita, T. Yoshida, N. Momo, T. Ohguro, |
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H. S. Momose, and Y. Toyoshima, Toshiba Corporation, Yokohama,
Japan. |
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15:50 – 16:05 |
Emission Microscopy
analysis of hot cluster defects of imagers processed on SOI |
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4.04 |
G. Meynants,
W. Diels, J. Bogaerts, W. Ogiers,
CMOSIS, Antwerp, Belgium. |
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16:05 – 16:30 |
Break |
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Session 05 |
Poster Flash Presentations |
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16:30 – 17:30 |
Session chair: Bart Dierickx
(Caeleste) |
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5.01 |
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Mukul Sarkar (Indian
Institute of Technology Delhi), Bernhard Büttgeny |
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(Mesa Imaging), and
Albert J.P. Theuwissen (University of Technology |
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Delft/Harvest
Imaging). |
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5.02 |
1280x1024 Logarithmic
Snapshot Image Sensor with Photodiode in |
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Yang Ni, New Imaging
Technologies SA, France. |
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5.03 |
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Abderrezak Mekkaoui, Dario Gnani, Maurice Garcia-Sciveres,
Lawrence Berkeley |
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National Laboratory,
Berkeley, CA, USA. |
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5.04 |
Logarithmic Image Sensor
for Wide Dynamic Range Stereo Vision System |
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Christian Bouvier, |
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Yang Ni, New Imaging
Technologies SA, France. |
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5.05 |
Segmented-base CMOS Image Sensor for Machine Vision Application |
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Tomohiro Yamazaki, Toshinori Otaka and Takayuki Hamamoto |
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Tokyo University of
Science, Tokyo, Japan. |
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5.06 |
1.1um Back-Side Illuminated
Image Sensor Performance Improvement |
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Chi Han_Lin 1(a), Chih-Kung
Chang 1, Yu-Kun Hsiao1, Yueh-Ching
Cheng1 |
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Chih-Cherng Jeng2, Kuo-Cheng
Lee2, Chun-Hao Chou2, Yi-Yi
Cheng2, |
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Yen-Hsung Ho2, Yin-Chieh
Huang2, Chin-Chuan Hsieh1; |
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1VisEra Technologies Company, Hsinchu
Science Park, Taiwan; 2: Taiwan |
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Semiconductor
Manufacturing Company, Hsinchu Science Park,
Taiwan. |
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5.07 |
CF/ML Shift Optimization
for Small Pixel CMOS Image Sensor through |
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Wu-Cheng Kuo1,
Wei-Chieh Chiang2, Ren-Jie
Lin2, Yu-Kun Hsiao1, Jen-Cheng Liu2, |
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Tsung-Hao Lin1, Hui-Min
Yang1, D.N. Yaung2, and Shou-Gwo Wuu2,
Chin-Chuan Hsieh1 |
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1VisEra Technologies Company, Hsinchu Science Park, Taiwan |
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2Taiwan Semiconductor Manufacturing Company, Hsinchu Science Park, Taiwan. |
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5.08 |
The Image Quality
Standard based on Human Visual System for the Spectral |
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Kazuyuki Matsushima, Masaaki
Sato, Shinichiro Saito, Sony Corporation, |
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Tokyo, Japan. |
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5.09 |
Application Demonstration Of
Polarization-Analyzing CMOS Image Sensor |
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and Performance Improvement
Using 65 nm Standard CMOS Process |
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Takashi TOKUDA, Norimitsu WAKAMA, Toshihiko NODA, Kiyotaka
SASAGAWA, |
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Kiyomi KAKIUCHI, and Jun OHTA, Graduate School of
Materials Science, Nara |
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Institute of Science and
Technology, Nara, Japan. |
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5.10 |
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Anders Johannesson and Henrik Eliasson, Axis Communications AB, Lund, Sweden. |
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5.11 |
A Passive
Integrator to Achieve Low Power, Low Noise Signal Amplification |
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Yannick De Wit, ON-Semiconductor, Mechelen,
Belgium. |
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5.12 |
BSI Low Light Level CMOS
Image Sensor Employing P-type Pixel |
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John Tower, James Janesick, Thomas Senko, Peter Levine, Mark Grygon, James Andrews, |
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Judy Zhu, Thomas Vogelsong, SRI International, Princeton, NJ, USA |
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Guang Yang, Steven Huang, Chao Sun, Barmak Mansoorian, Forza Silicon Corporation, |
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Pasadena, CA, USA. |
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5.13 |
A Low Power Counting Method in
Ramp ADCs used in CMOS Image Sensors |
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Cheng Ma, Xinyang Wang, ChangChun
Institute of Optics, Fine Mechanics and Physics, |
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Chinese Academy of
Science, Changchum, China. |
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5.14 |
Single Slope ADC with On-chip
Accelerated Continuous-time Differential Ramp |
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Dexue Zhang, Rami Yassine,
Loc Truong, Jeff Rysinski,
Daniel Van Blerkom and |
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Barmak Mansoorian, Forza Silicon Corporation, Pasadena, CA, USA. |
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5.15 |
Division-of-Focal-Plane
Spectral-Polarization Imaging Sensor |
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Viktor Gruev, Meenal Kulkarni, Department of Computer Science and Engineering,
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Washington University
in Saint Louis, Saint Louis, MO, USA. |
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5.16 |
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Carlos A. de Moraes Cruz(*)(**), Davies W. de Lima Monteiro(***), Gilles Sicard(****) |
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and Alexandre K.
P. Souza(*), (*)Department of Electronics and
Computation, |
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Universidade Federal do Amazonas, Manaus, AM, Brazil; (**)Graduate
Program in |
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Electrical Engineering
- Federal University of Minas Gerais, Belo
Horizonte, MG, |
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Brazil;(***)Department
of Electrical Engineering, DEE/PPGEE, Universidade |
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Federal de Minas Gerais, Belo Horizonte, MG, Brazil; (****)TIMA
Laboratory, |
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CNRS, Grenoble INP,
Grenoble, France. |
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5.17 |
Reduction of Motion Blur in
CMOS Linear Arrays and TDI Imagers |
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Benoit Dupont, Bart Dierickx, Caeleste, Antwerp, Belgium. |
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5.18 |
Column-Parallel
Architecture for Line-of-Sight Detection Image Sensor based |
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Hayato Kawakami, Satori Igarashi, Yuta Sasada, Junichi Akita,
School of Electrical and |
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Comp. Eng., Kanazawa
University, Kanazawa, Ishikawa, Japan. |
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5.19 |
Image Lag Analysis and
Photodiode Shape Optimization of 4T CMOS Pixels |
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Yang Xu1,
Albert J.P. Theuwissen1, 2; 1: Delft University of
Technology, Delft, |
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the Netherlands; 2:
Harvest Imaging, Bree, Belgium. |
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5.20 |
A Radiation Tolerant 4T
pixel for Space Applications: Layout and |
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Manuel Innocent, ON
Semiconductor, Mechelen, Belgium. |
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Friday, June 14, 2013 |
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7:00 - 8:30 |
Breakfast |
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Session 06 |
Avalanche Photo Diode and Photon Counting |
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Session chair: Lindsay Grant (ST
Microelectronics) |
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8:30 – 8:45 |
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6.01 |
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Lucio Pancheri a,
Olga Shcherbakova a,b,
Nicola Massarib, Gian-Franco
Dalla Bettaa |
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and David Stoppab, a: University of Trento,
Trento, Italy; b: Fondazione Bruno Kessler, |
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Trento, Italy. |
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8:45 – 9:00 |
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6.02 |
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Jau-Yang Wu, Shu-Cheng Li,
Fang-Ze Hsu, and Sheng-Di Lin, Department of |
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Electronics
Engineering, National Chiao Tung University, Hsinchu, Taiwan. |
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9:00 – 9:15 |
9.8μm SPAD-based Analogue
Single Photon Counting Pixel with Bias |
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6.03 |
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Neale A.W. Dutton 1,
2, Lindsay A. Grant1, Robert K. Henderson2 |
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1ST Microelectronics Imaging Division, Pinkhill, Edinburgh, UK, |
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2The University of Edinburgh, Edinburgh, UK. |
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9:15 – 9:30 |
Stabilizing Sensitivity
in Large Single-Photon Image Sensors with an |
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6.04 |
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Shingo Mandaiy and Edoardo Charbon, Delft University of Technology, Delft, |
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The Netherlands. |
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9:30 – 9:45 |
A 92k SPAD Time-Resolved
Sensor in 0.13μm CIS Technology for |
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6.05 |
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Richard J. Walker1,
Leo H. C. Braga2, Ahmet T. Erdogan1,
Leonardo Gasparini2, |
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Lindsay A. Grant3, Robert K.
Henderson1, Nicola Massari2, Matteo
Perenzoni2, |
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David Stoppa2;
1CMOS Sensors and Systems (CSS) Group, School of Engineering, |
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The University of
Edinburgh, Edinburgh, UK; 2Smart Optical Sensors and Interfaces |
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(SOI) Group, Fondazione Bruno Kessler (FBK), Trento, Italy; 3Imaging
Division, |
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STMicroelectronics,
Edinburgh, UK. |
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9:45 – 10:00 |
Monolithic Integration of LEDs
and Silicon Photomultipliers in Standard |
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6.06 |
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Nupur Lodha, Shingo Mandai, and Edoardo Charbon; Circuits and Systems, |
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Delft University of
Technology, Delft, The Netherlands. |
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10:00 – 10:15 |
Silicon Integrated Electrical
Micro-Lens for CMOS SPADs based on |
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6.07 |
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Chockalingam Veerappan, Student
Member IEEE, Yuki Maruyama, Member IEEE, |
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Edoardo Charbon, Senior
Member IEEE. |
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10:15 – 10:40 |
Break |
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Session 07 |
Poster Flash Presentations II |
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10:40 – 12:00 |
Session chair: Johannes Solhusvik (Omnivision) |
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7.01 |
Device Simulation with
Electromagnetic Field Propagation Models for |
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Hideki Mutoh, Link Research
Corporation, Odawara, Kanagawa, Japan. |
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7.02 |
Monolithic Integration of
Flexible Spectral Filters with CMOS Image Sensors |
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Murali Jayapala, Andy Lambrechts, Nicolaas Tack, Bert
Geelen, Bart Masschelein,
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Philippe Soussan ,
IMEC, Leuven, Belgium. |
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7.03 |
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Alper Ercan1, 2, Luc Haspeslagh1,
Koen De Munck1, Kyriaki
Minoglou1, Anne Lauwers1, |
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Piet De Moor; 1Imec, Heverlee, Belgium; 2ESAT KU Leuven, Heverlee, Belgium. |
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7.04 |
A Dual Exposure Method for
Wide Dynamic Range Operation of CMOS |
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Woon-Il Choi, Hashimoto Masashi1,
Masayuki Uno2 and Hi-Deok, Dept. of Electronics
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Engi., Chungnam National
Univ., Daejeon, Korea; 1: LG Innotek,
Ansan, Kyeonggi, |
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Korea; 2:
Linear Cell Design Corp. Ina-shi, Nagano, Japan. |
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7.05 |
A Low-Invasive Micro Imaging
Device for Measuring Neural Activities |
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Jun Ohta, Chiakra Kitsumoto, Makito Haruta, Yoshinori Sunaga, Toshihiko Noda, |
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Kiyotaka Sasagawa,Takashi Tokuda, Mayumi Motoyama, and Yasumi Ohta |
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Graduate School of
Materials Science, Nara Institute of Science and Technology, |
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Nara, Japan. |
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7.06 |
Designing Incremental
Sigma-Delta ADCs for Low Thermal Noise in |
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Adi Xhakoni, Georges Gielen, KU Leuven, Dept. Elektrotechniek
ESAT-MICAS, |
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Leuven, Belgium. |
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7.07 |
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Song Chen, Andrew Ceballos, and Eric R. Fossum, Thayer School of
Engineering |
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at Dartmouth, Hanover, NH, USA. |
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7.08 |
Design of Analog Readout
Circuitry with Front-end Multiplexing for |
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Steven Huang, David
Estrada, Daniel Van Blerkom and Barmak
Mansoorian, |
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Forza Silicon Corporation, Pasadena, CA, USA. |
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7.09 |
RF Design Issues and
Challenges in a CMOS Image Sensor Process |
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Loc Truong, Dexue
Zhang, Tomer Leitner1 and Barmak Mansoorian, Forza |
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Silicon Corporation,
Pasadena, CA, USA, 1: Tower Semiconductor LTD. |
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7.1 |
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Arnaud Verdant, Antoine Dupret,
Patrick Villard, Laurent Alacoque (CEA - LETI –
MINATEC |
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Campus, Grenoble, France),
Hervé Mathias, Flavien Delgehier (IEF, Orsay, France). |
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7.11 |
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Zhongxiang Cao, Yangfan Zhou, Quanliang Li, Qi Qin, Liyuan
Liu, and Nanjian Wu |
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State Key Laboratory
of Superlattices and Microstructures, Institute of |
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Semiconductors,
Chinese Academy of Sciences, Beijing, P. R. China. |
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7.12 |
A Multi-Channel Digital
Silicon Photomultiplier Array for Nuclear Medical |
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Shingo Mandaiy and Edoardo Charbon, Delft University of Technology, Delft, |
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The Netherlands. |
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7.13 |
Real-time Calibration of a
14-Bit Single Slope ADC with 290MHz |
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On-chip Accelerated Ramp
Generator for Column-Parallel Image Sensors |
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Jonathan Bergey, Sam Bagwell, Jackson Law, Wilson Law, Forza Silicon |
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Corporation, Pasadena,
CA, USA |
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7.14 |
A Novel Architecture for the
Implementation of a Family of High Speed, |
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M. Moser, E. Fox, D. Deering, P. Donegan, M. Sonder, D. Marchesan, D. Verbugt, |
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Binqiao Li, Feng-Hua Feng, Shujuan Xie, N. Safavian, R. Ghannoum, H. Mei, |
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TELEDYNE DALSA
Corporation, Waterloo, ON, Canada. |
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7.15 |
On The Pixel Level
Estimation of Pinning Voltage, Pinned Photodiode |
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Vincent Goiffon1,
Julien Michelot2, Pierre Magnan1,
Magali Estribeau1, Olivier |
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Marcelot1,
Paola Cervantes1, Alice Pelamatti1, and Philippe
Martin-Gonthier1, |
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1ISAE, Université
de Toulouse, Toulouse, France; 2Pyxalis, Grenoble, France. |
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7.16 |
Novel Auto-Adaptative Integration-Time Technique for CMOS Image
Sensor |
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Hassan Abbass1,
Hawraa Amhaz1, David Alleyson2,
Gilles Sicard1, 1TIMA |
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Laboratory (CNRS,
Grenoble INP, UJF, 2LPNC Laboratory, Pierre Mendes |
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France University,
Grenoble, France. |
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7.17 |
A Broadcast Quality 2.3MP
CMOS Image Sensor with Dynamic Range |
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Emanuele Mandelli, Lester
Kozlowski, AltaSens Inc,
Westlake Village, CA, USA. |
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7.18 |
A Fully Depleted
Backside Illuminated CMOS Imager with VGA Resolution |
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Stefan Lauxtermann, Vikram Vangapally, Sensor Creations Inc. (SCI), |
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Camarillo, CA, USA. |
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7.19 |
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Pablo N. A. Belmonte1,2,
P.J. French2, Davies W. De Lima Monteiro1, Frank Sill
Torres1, |
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1Department of Electrical Engineering, DEE/PPGEE,
Universidade Federal de |
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Minas Gerais, Belo Horizonte, MG, Brazil; 2Delft
University of Technology, |
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Electronic
Instrumentation Laboratory, Delft, The Netherlands. |
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7.2 |
Jailbreak
Imagers: Transforming a Single-Photon Image Sensor into a True |
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Samuel Burri1, Damien Stucki2, Yuki
Maruyama3, Claudio Bruschini1, Edoardo
Charbon3, |
|
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Francesco Regazzoni3,
1EPFL, School of Engineering, Lausanne, Switzerland; |
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2ID Quantique,
Switzerland; 3Delft University of Technology, Delft, Netherlands. |
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7.21 |
Comparison of Two Cameras
based on Single Photon Avalanche Diodes |
|
(SPADS) for Fluorescence
Lifetime Imaging Application with Picosecond |
||
F. Powolny1, S. Burri1, C. Bruschini1,2,
X. Michalet3, F. Regazzoni4 , E. Charbon1,4,
|
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1Ecole Polytechnique Fédérale de Lausanne (EPFL), Lausanne, Switzerland; |
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2Centre Hospitalier Universitaire Vaudois (CHUV),
Lausanne, Switzerland; |
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3University of California, Los Angeles (UCLA),
Los Angeles, USA; |
||
4Delft University of Technology, Delft, The
Netherlands. |
||
7.22 |
Radiation-hard Active Pixel
Detectors for Tracking of Charged Particles |
|
F. Bompard,1
S. Feigl,2 M. Garcia-Sciveres,3 L. Meng,2 D.
Muenstermann,4 |
||
P. Pangaud,1 I. Peric,5
and A. Rozanov1, 1CPPM, Aix-Marseille Universite,
Marseille, |
||
France; 2CERN,
Geneve, Switzerland; 3Lawrence Berkeley
National Laboratory, |
||
Berkeley, CA, USA; 4DPNC,
Universite de Geneve, Geneve, Switzerland; |
||
5Institute for Computer Science, University of
Heidelberg, Mannheim, Germany. |
||
7.23 |
Digital Calibration
Algorithm for 2-Stage Cyclic ADC used in 33-Mpixel |
|
T. Watabe1,4,
K. Kitamura2,4, T. Hayashida2, T. Kosugi3,
H. Ohtake2, H. Shimamoto2, |
||
S. Kawahito3,4,
and N. Egami2; 1NHK Engineering System, Inc., Setagaya-ku, Tokyo, |
||
JAPAN ; 2NHK
Science and Technology Research Laboratories; |
||
3Brookman Technology, Inc.; 4Shizuoka
University, Japan. |
||
7.24 |
An Optical Punch-Through
Diode and Gate Biasing 1-T Pixel for Binary |
|
Hyung-june Yoon1 and Edoardo
Charbon1,2; 1EPFL, Lausanne, Switzerland; |
||
2Delft University of Technology, Delft,
Netherlands. |
||
7.25 |
A
5.2Mpixel@250Fps 16Gbps CMOS Image Sensor with Embedded Digital |
|
Processor for Reconfigurability and on-chip Image Correction |
||
Francisco Jiménez-Garrido 1,
José Fernández-Pérez 1, Cayetana Utrera 1,
José Ma Muñoz 1, |
|
|
Ma. Dolores Pardo 1,
Rafael Domínguez-Castro 1, Fernando Medeiro 1 and Angel |
||
Rodríguez-Vázquez 2,1; 1Universidad de Sevilla, Instituto de Microelectrónica de |
||
Sevilla (IMSE-CNM), Sevilla,
Spain; 2Consejo Superior de Investigaciones
Científicas |
||
(CSIC), Instituto de Microelectrónica
de Sevilla (IMSE-CNM); 3Innovaciones |
||
Microelectrónicas S.L. (ANAFOCUS); Sevilla
(Spain). |
||
7.26 |
Reconfigurable
Focal-Plane Hardware for Block-Wise Intra-Frame HDR Imaging |
|
Jorge Fernandez-Berni, Ricardo Carmona-Galan, Angel
Rodrıquez-Vazquez, |
||
Institute of
Microelectronics of Seville (CSIC - Universidad de Sevilla)
Seville, Spain. |
||
12:00 - 13:30 |
Lunch |
|
13:30 - 17:30 |
Social Event - Tram Ride to Hidden Peak (11,000
ft) |
|
17:30 – 19:00 |
Poster viewing and reception |
|
Saturday, June 15, 2013 |
||
7:00 - 8:30 |
Breakfast |
|
Session 08 |
Invited Presentation, Array Imagers and Large
Area Sensors |
|
|
Session co-chairs: Junichi Nakamura (Aptina
Imaging), |
|
|
Shouleh
Nikzad (JPL, California Institute of Technology) |
|
8:45 – 9:05 |
||
8.01 |
Gal Shabtay, Noy Cohen, David Mendlovic and Eran Kali, Corephotonics Ltd, Israel. |
|
9:05-9:20 |
LASSENA: A 6.7 Megapixel, 3-sides
Buttable Wafer-Scale CMOS Sensor |
|
8.02 |
||
I Sedgwick, D Das, N Guerrini,
B Marsh, R Turchetta, Science and Technology |
||
Facilities Council,
Rutherford Appleton Laboratory, UK. |
||
9.20 – 9.35 |
Requirements,
Developments and Challenges for CCD and CMOS Image |
|
8.03 |
||
P.Garé, N.Nelms, Y.Nowicki-Bringuier, D.Martin, R.Meynart, M.Zahir, |
||
European Space Agency,
Noordwijk, The Netherlands. |
||
9:35 – 9:50 |
Fabrication of Large Format,
Fully Depleted CCDs for the Dark Energy |
|
8.04 |
||
S.E. Holland1,
C.J. Bebek1, K.S. Dawson4, H.T. Diehl3, F.
Dion2, J.H. Emes1, |
||
J. Estrada3, R. Frost2,
R. Groulx2, A. Karcher1, W.F. Kolbe1, D.
Kubik3 , |
||
N.P. Palaio1,
C.H. Tran1, G. Wang1, and N.A. Roe1; 1Lawrence
Berkeley National |
||
Laboratory, Berkeley,
CA, USA; 2Teledyne DALSA Semiconductor, Bromont,
|
||
Québec, Canada; 3Fermi
National Accelerator Laboratory, Batavia, IL, USA; |
||
4University of Utah, Salt Lake City, UT, USA. |
||
9:50 – 10:05 |
||
8:05 |
||
Kwang-Bo Cho1, Nick Tu1, John
Brummer1, Khandaker Azad1,
Leo Hsu1, Vivian Wang1, |
||
Dongsoo Kim1,
Krishna Palle1, Tien-Min Miao1,
Yandong Chen1, Canaan Hong1, |
||
Toan Bao1, Vitanshu
Sharma1, Yuan Fong1, Kumudini
Irkar1, Syed Hashmi1, Vinesh |
||
Sukumar1, Salman Kabir1, Gershon Rosenblum1, Yong Gao1, Kil-Ho Ahn2, Hyuk-Jin
Ko2, |
|
|
Jeff Watson3, Chris Kenoyer3;
1Aptina, LLC, San Jose, CA, USA; 2Aptina Korea Co, |
||
Seoul, Korea; 3Aptina,
LLC, Corvallis, OR, USA. |
||
10:05 – 10:30 |
Break |
|
Session 09 |
Image Sensor Design |
|
|
Session chair: Alex Krymski
(Alexima) |
|
10:30 – 10:45 |
||
9.01 |
Eric R. Fossum, Thayer
School of Engineering at Dartmouth, Hanover, NH, USA. |
|
10:45 – 11:00 |
||
9.02 |
Saleh Masoodian, Yue Song, Donald Hondongwa, Jiaju Ma, Kofi Odame |
|
and Eric R. Fossum, Thayer School of Engineering
at Dartmouth, Hanover, NH, USA. |
||
11:00 – 11:15 |
Organic CMOS Image Sensor with
Thin Panchromatic Organic Photoelectric |
|
9.03 |
||
Mikio Ihama1, Hideyuki Koguchi1,
Hiroshi Inomata1, Hideki Asano1,Yuuki Imada1,
|
||
Yasuyoshi Mishima1,
Yoshihisa Kato2, Yutaka Hirose2,Mizuki Segawa2, |
||
Tetsuya Ueda2,
Shinji Kishimura2; 1Frontier Core-Technology
Laboratories, |
||
FUJIFILM Corporation,
Kanagawa, Japan; 2Industrial Devices Company, |
||
Panasonic Corporation1,
Nagaokakyo City, Kyoto, Japan. |
||
11:15 – 11:30 |
A 1-inch Optical Format,
80fps, 10.8Mpixel CMOS Image Sensor |
|
9.04 |
||
Isao Takayanagi, Norio Yoshimura, Toshiaki Sato, Shinichiro
Matsuo, Tetsuji Kawaguchi, |
||
Kazuya Mori,Shinji Osawa, †Timothy
Bales, ††Ernesto S. Gattuso, ††Douglas
Fettig, |
||
††Bob Gravelle, ††Dan
Pates,††Scott Johnson, Junichi Nakamura, |
||
Aptina Japan, †Aptina
UK, ††Aptina Imaging. |
||
11:30 – 11:45 |
A 4K2K 60-fps Image Sensor
Based on Stagger-laced Dual-exposure Technique |
|
9.05 |
Yusuke Okada, Takeo
Azuma, Toshinobu Matsuno,
Hiroyoshi Komobuchi
(Panasonic |
|
Corporatio, Kyoto, Japan), Jan Craninckx,
Bertrand Parvais, Kyriaki
Minoglou, |
||
Koen De Munck, Luc Haspeslagh, Piet De Moor (IMEC, Heverlee,
Belgium), |
||
Serge Biesemans (now at TEL Europe). |
||
11:45 – 12:00 |
24 MPixel
36x24mm2 14 bit Image Sensor in 110/90 nm CMOS Technology |
|
9.06 |
G. Meynants,
J. Bogaerts, B. Wolfs, B .Ceulemans,
T. DeRidder, A. Gvozdenović, |
|
E. Gillisjans,
X. Salmon, G. VandeVelde, CMOSIS nv, Antwerp,Belgium. |
||
12:00 – 12:15 |
A 1.1e-rms Temporal Noise
87.5dB DR CMOS Image Sensors With Low-Noise |
|
9.07 |
||
Min-Woong Seo1, Takehide Sawamoto2, Tomoyuki
Akahori2, Zheng Liu2, Keita
Yasutomi1, |
|
|
Keiichiro Kagawa1, and Shoji
Kawahito1,2; 1Research Institute of Electronics,
Shizuoka |
||
University, Johoku, Hamamatsu, Japan; 2Brookman
Technology, Inc, Hamamatsu, Japan. |
||
12:15 – 13:45 |
Lunch |
|
Session 10 |
Depth Sensing, TOF, and Time Resolving
Imaging. |
|
|
Session co-chairs: David Stoppa
(Fondazione Bruno Kessler), |
|
|
Edoardo Charbon (Delft
University of Technology) |
|
13:45 – 14:00 |
A CMOS Image Sensor for
In-Pixel Background Suppression and Frequency |
|
10.01 |
and Phase Detection for
Structured Light 3-D Acquisition Systems |
|
Hiroki Yabe (Department
of Electrical Engineering and Information Systems, The |
||
University of Tokyo,
Tokyo, Japan) and Makoto Ikeda (VLSI Design and Education |
||
Center (VDEC), The
University of Tokyo, Tokyo, Japan). |
||
14:00 – 14:15 |
Compact Ambient Light
Cancellation Design and Optimization for 3D |
|
10.02 |
||
Yibing M. Wang1, Ilia Ovsiannikov1,
Sung-Jae Byun2, Tae-Yon Lee2, Yongjei
Lee3, |
||
Grzegorz Waligorski1, Hongyu Wang1, Seunghoon
Lee2, Dong-Ki Min2, Yoondong
Park2 , |
|
|
Tae-Chan Kim2,
Chi-Young Choi2, Gabsoo Han2,
and Eric R. Fossum1,2 ; |
||
1Samsung Semiconductor, Inc., Pasadena, CA,
USA; |
||
2Samsung Electronics Co. Ltd.,
Image Development Team, Giheung, South Korea; |
||
3Kunsan National University,
Dept. of Physics, Jeonbuk, South Korea. |
||
14:15 – 14:30 |
3dim: Compact and Low Power
Time-of-Flight Sensor for 3D Capture Using |
|
10.03 |
||
Andrea Colaco1;2,
Ahmed Kirmani1, Nan-Wei Gong1;2,Tim McGarry3,
Laurence Watkins3, |
||
and Vivek K Goyal1,
1Massachusetts Institute of Technology; 23dim Tech,
Inc.; |
||
3Princeton Optronics. |
||
14:30 – 14:45 |
CMOS Image Sensor for 3-D
Range Map Acquisition With Pixel-Parallel |
|
10.04 |
||
Takahiko Matsushima1
and Makoto Ikeda2; 1Department of Electrical Engineering |
||
and Information
Systems, The University of Tokyo; 2VLSI Design and Education
Center |
||
(VDEC), The University of Tokyo, Tokyo,
Japan. |
||
14:45 – 15:00 |
A Time-of-Flight Image
Sensor with Sub-mm Resolution Using Draining Only |
|
10.05 |
||
Keita Yasutomi, Takahiro Usui,
Sang-Man Han, Masatoshi Kodama,Taishi Takasawa, |
||
Keiichiro Kagawa,
Shoji Kawahito; Shizuoka University, Hamamatsu,
Japan. |
||
15:00 – 15:15 |
CMOS Lock-in Pixel Image Sensors
with Lateral Electric Field Control for |
|
10.06 |
||
Shoji Kawahito, Guseul Baek, Zhuo Li, Sang-Man Han,
Min-Woong Seo, |
||
Keita Yasutomi and Keiichiro Kagawa; Research Institute of
Electronics, |
||
Shizuoka University,
Hamamatsu, Japan. |
||
15:15 – 15:40 |
Break |
|
Session 11 |
Invited Presentation and High Speed. |
|
|
Session chair: Shoji Kawahito
(Shizuoka University) |
|
15:40 – 15:55 |
CMOS Image Sensor
Pixel with 2D CCD Memory Bank for Ultra High Speed |
|
11.01 |
||
A. Lahav#,
J. Crooks* , B. Marsh*, R. Turchetta
*, and A. Fenigstein#, |
||
#TowerJazz Semiconductor Ltd, Migdal
Haemek, Israel; |
||
*STFC Rutherford Appleton Laboratory, Didcot, Oxfordshire, UK. |
||
15:55 – 16:10 |
Ultra‐High Speed
Imaging At Megaframes per Second with A Megapixel |
|
11.02 |
||
J. Crooksa,
B. Marsha, R. Turchettaa, K. Taylorb, W. Chanb,
A. Lahavc, A. Fenigsteinc,
|
||
aSTFC Rutherford Appleton Laboratory, Didcot,
Oxfordshire, UK; |
||
bSpecialised Imaging, Tring, Hertfordshire, UK; |
||
cTowerJazz Semiconductor Ltd, Migdal Haemek, Israel. |
||
16:10 – 16:25 |
High Speed, Backside Illuminated
1024x1 Line Imager with Charge Domain |
|
11.03 |
||
Martin Popp, Beat De Coi, Dieter Huber, Pascal Ferrat,
Markus Ledergerber, |
||
Espros Photonics AG, Sargans,
Switzerland. |
||
16:25 – 16:40 |
Toward one Giga frames per
second: Multi-Collection-Gate BSI Image Sensors |
|
11.04 |
Takeharu G. Etoh1, Son V. T. Dao1,
Tetsuo Yamada2 and Edoardo Charbon3,
|
|
1Ritsumeikan University, Kusatsu, Japan; 2Tokyo
Polytechnic University, Atsugi, |
||
Japan; 3Technische
Universiteit Delft, Delft, the Netherlands. |
||
16:40 – 16:55 |
A 5 Megapixel, 1000fps CMOS Image
Sensor with High Dynamic Range |
|
11.05 |
||
Bart Cremers, Manuel Innocent, Carl Luypaert,
John Compiet, Ishwar
Chandra |
||
Mudegowdar, Cedric Esquenet, Genis, Chapinal, Wiet Vroom, Tim Blanchaert, |
||
Thomas Cools, Joost Decupere, Roel Aerts, Peter Deruytere, Tomas Geurts; |
||
ON Semiconductor, Mechelen, Belgium. |
||
16:55 – 17:15 |
Keynote Presentation: Many Pixels Make Light Work |
|
11.06 |
Mike Tompsett |
|
18:30 – 20:30 |
Dinner and 2013 IISS Awards |
|
Best Poster Award |
||
Song Chen, et al., |
||
K. Kitamura, et al. |
||
Exceptional Service Award
to |
||
Albert JP Theuwissen |
||
"For exceptional contributions
to the education of image sensor specialists" |
||
Exceptional Lifetime
Achievement Award to |
||
Gene Weckler |
||
"For exceptional
contributions to the field of solid-state image sensors" |
||
Sunday, June 16, 2013 |
||
7:00 - 8:30 |
Breakfast |
|
Session 12 |
Global Shutter |
|
|
Session chair: Albert Theuwissen (Harvest
Imaging) |
|
8:30 – 8:45 |
Low Noise High Efficiency 3.75μm
and 2.8μm Global Shutter CMOS |
|
12.01 |
||
Sergey Velichko1,
Gennadiy Agranov2, Jaroslav
Hynecek2, Scott Johnson1, Hirofumi |
||
Komori2, Jenny Bai2, Igor Karasev2,
Rick Mauritzson1, Xianmin Yi2,
Victor Lenchenkov2, |
|
|
Sarah Zhao2, Hyuntae
Kim1; 1Aptina, Meridian, ID, USA, 2Aptina,
San Jose, CA, USA. |
||
8:45 – 9:00 |
IR Enhanced
Global Shutter Pixel for High Speed Applications |
|
12.02 |
Assaf Lahav1, Adi
Birman1, Dima Veinger1, Amos
Fenigstein1, Dexue Zhang2, |
|
Daniel Van Blerkom2;
1TowerJazz Semiconductor Ltd, Migdal Haemek, Israel; |
||
2Forza Silicon Corp., CA, USA. |
||
9:00 – 9:15 |
3.5 μm
Global Shutter Pixel With Transistor Sharing And Correlated |
|
12.03 |
||
B. Wolfs, J. Bogaerts, G. Meynants; CMOSIS nv, Antwerpen, Belgium. |
||
9:15 – 9:30 |
||
12.04 |
Alex Krymski, Luxima Technology LLC/
Alexima, Pasadena, CA, USA. |
|
9:30 – 9:45 |
High Frame-Rate
Global Shutter Image Sensor with Dual-Reset Branch |
|
12.05 |
||
Daniel Van Blerkom, Jeff Rysinski, Yingying Wang, Kevin Stevulak,
Christophe Basset, |
||
Loc Truong, Rami Yassine,
Guang Yang, Chao Sun, Kai Ling Ong,
Steve Huang, |
||
Forza Silicon Corporation, Pasadena, CA, USA. |
||
9:45 – 10:00 |
A 4e-Noise 2/3-inch Global
Shutter 1920x1080p120 CMOS-Imager |
|
12.06 |
Peter Centen1,
Steffen Lehr2 , Sabine Roth2, Jeroen
Rotte1, Friedrich Heizmann2, |
|
Akbar Momin2
,Ralf Dohmen2, Karl-Heinz Schaaf2, Klaas
Jan Damstra1 , Ruud van Ree1, |
||
Michael Schreiber2; 1
Grass Valley, Breda, The Netherlands. |
||
.2Viimagic;
Villingen, Germany. |
||
10:00 – 10:25 |
Break |
|
Session 13 |
Invited Presentation, Oversampling, and High
Dynamic Range |
|
|
Session co-chairs: Shigetoshi
Sugawa (Tohoku University), |
|
|
Vladimir Koifman (Analog Value) |
|
10:25 – 10:45 |
||
13.01 |
Juha Alakarhu, Samu Koskinen, Eero Tuulos, Nokia Corporation,
Camera |
|
Technologies, Tempere, Finland. |
||
10:45 – 11:00 |
Overcoming the Full Well
Capacity Limit: High Dynamic Range Imaging |
|
13.02 |
||
Thomas Vogelsang, Michael Guidash,
Song Xue, Rambus Inc,
Sunnyvale, CA, USA. |
||
11:00 – 11:15 |
A Comparison of High
Dynamic Range CIS Technologies for Automotive |
|
13.03 |
||
Johannes Solhusvik, Jiangtao Kuang, Zhiqiang Lin, Sohei Manabe, Jeong-Ho Lyu, |
||
Howard Rhodes, OmniVision Technologies. |
||
11:15 – 11:30 |
An Overflow Photo-Gate
Pixel Enables High FWC and Improved Proton |
|
13.04 |
||
Yannick De Wit & Manuel Innocent,
ON-Semiconductor, Mechelen, Belgium. |
||
11:30 – 11:45 |
||
13.05 |
Gilles Sicard1,
Hassan Abbas1, Hawraa Amhaz1 ,*,
Hakim Zimouche1,**, |
|
Robin Rolland2,
David Alleysson3; 1CNRS, G-INP, UJF, TIMA Laboratory, |
||
Grenoble, France; 2CIME-Nanotech,
Grenoble, France; 3CNRS, UPMF, LPNC |
||
Laboratory, Grenoble,
France; *Now with CEA LETI, **Now with LIRMM |
||
Laboratory, Montpellier,
France. |
||
11:45 - 12:00 |
Wrap Up and Closing |
|
Boyd Fowler, Co-Chair |
||
12:00 - 13:30 |
Lunch |
|
Fin |
||