1999 IEEE Workshop on Charge-Coupled Devices and Advanced Image Sensors
June 10-12, 1999
Karuizawa Prince Hotel
Karuizawa, Nagano, Japan
Thursday, June 10 8:30 am
Opening Remarks
N. Teranishi
J. Nakamura
Session 1. CCD Image Sensors
Chairman N. Teranishi (NEC) 8:45 am
A 2/3-in. 2,200k-pixel FIT-CCD for HDTV 1080i
Suzuki, T. Yamaguchi, T. Torikai, N. Iwawaki, M. Yamanaka,
Hirata, H. Tanaka, K. Yokozawa, M. Tamura and T. Imanishi
CCD Division, Matsushita Electronics Corporation, Japan
BCD-A New High Performance Nondestructive Charge Detection Concept for CCD Image Sensors
Hynecek and H. Shibuya*
ISETEX Inc, U.S.A. *Texas Instruments Japan Limited, Japan
Influence of Sensor Settings and Doping Profile on Dark Current in
FT-CCD’s
O. Folkerts, A. Heringa, H. Peek, D. Verbugt and L. Korthout
Philips Semiconductors Image Sensors, The Netherlands
Dynamic Range Improvement by Narrow-Channel Effect Suppression and Smear Reduction Technologies in Small Pixel IT-CCD Image
Sensors
Tanabe, Y. Kudoh, Y. Kawakami, K. Masubuchi, S . Kawai, T. Yamada,
M. Morimoto*, K. Arai, K. Hatano**, M. Furumiya**, Y. Nakashiba**,N.
Mutoh, K. Orihara and N. Teranishi
Silicon Systems Research Labs., NEC, Japan *System Micro Division,
NEC, Japan **ULSI Device Development Labs. NEC, Japan
Session 2: CMOS Image Sensors
Chairman J. Nakamura (Olympus) 10:55 am
256 x 256 Pixel CMOS Imager with Linear Readout and 120dB Dynamic
Range
Schanz, C. Nitta, T. Eckart, B. J. Hosticka and R. Wertheimer*
Fraunhofer Institute ofMicroelectronic Circuits and Systems, Germany
*Center of Research and Engineering, BMW; Germany
692 x 504 CMOS APS Imager with Extended Dynamic Range and on-chip 12~bit ADC
WITHDRAWN G.W. Hughes, N. McCaffrey, D. Sauer, F. Hsueh, P. Levine, and F.
S. Pantuso Sarnoff Corporation. USA
A 1/3″ VGA CMOS Imaging System on a Chip
Agwani, R. Cichomski, M. Gorder, A. Niederkorn, M. Skow and K.
Wanda
Motorola Inc., U.S.A.
Low Dark Current Pinned Photo-Diode for CMOS Image Sensor
Inoue, H. Ihara, H. Yamashita, T. Yamaguchi, H. Nozaki and R.
Miyagawa
Toshiba Corp. Japan
Session 3. CMOS Image Sensors
Chairman B. Dierickx (IMEC)
A Smart CMOS Imager with On-Chip High-Speed Windowed Centroiding
Capability
Sun, G. Yang, C. Wrigley, O. Y. Pecht* and B. Pain
Center for Space Microelectronics Technology, JPL, U.S.A. *Electrical
and Computer Eng. Dept., Ben-Gurion University, Israel
Time-Domain Correlation Image Sensor: First CMOS Realization of Demodulator
Pixels Array
Ando and A. Kimachi
Dept. Mathematical Eng. and Information Physics, Univ. of Tokyo, Japan
Spatially Variant Flexible Sampling Control Integrated on a Sensor Focal
Plane
Ohtsuka, T. Hamamoto and K. Aizawa
Dept. Electrical Engineering, University of Tokyo, Japan
Image Transmission with a Retina-Like CMOS Camera
Sandini, P. Questa*, A. Mannucci*, F. Ciciani*, D. Scheffer**, and
B. Dierickx**
LIRA-Lab, DIST, University of Genova, Italy *Unitek Consortium, Italy
**IMEC-Leuven, Belgium
Session 4. Poster Session
Chairman:
J. Hynecek (ISETEX)
Orihara (NEC)
A Digital Pixel Image Sensor with 1-bitADC and 8-bit Pulse Counter in Each Pixel
Andoh, M. Nakayama, H. Shimamoto and Y. Fujita
Science & Technical Research Laboratories, NHK, Japan *Engineering
Administration Department, NHK, Japan
A 128 x 128 Photo-Gate CMOS–APS with 10-bit Successive Approximation ADC WITHDRAWN
Solhusvik. J.Bjornsen, S.Eikedal
Electronic Systems Dept., ABB, Norway
CMOS APS with Autoscaling and Customized Wide Dynamic
Range
Y. Pecht and A. Belenky
Electrical and Computer Eng. Dept., Ben-Gurion Univ. of the Negev,
Israel
A CMOS Image Sensor Integration Gamma Correction and Gain Control
Functions
Sasaki, S. Kawahito* and Y. Tadokoro*
Sendai National College of Technology, Japan *Toyohashi University of
Technology, Japan
An a-Se HARP Layer for a Solid-State Image Sensor
D. Park, Y. Takiguchi*, M. Kosugi*, M. Kubota*, Y. Ohkawa*, K.
Miyakawa*, S. Suzuki*, K. Shidara*, K. Tanioka*, A. Kobayashi**, and T.
Hirai**
Dongyang University, Korea *Science and Technical Research
Laboratories, NHK, Japan **Hamamatsu Photonics K.K., Japan
Buried Double Junction Pixel Using Green and Magenta
Filters
M. Findlater, P. B. Denyer*, R. K. Henderson*, J. E. D. Hurwitz*,
J. M. Raynor* and D. Renshaw
Dept. of Electronics and Electrical Engineering, The Univ. of
Edinburgh , UK *VLSI Vision Ltd., UK
A Vertically Integrated High Resolution Active Pixel Image Sensor for Deep
Submicron CMOS Processes
Benthien*, M. Wagner*, M. Verhoeven*, M. Bohm* **, B.Schneider**,
B. van. Uffel*** and F. Librecht***
*Silicon Vision GmbH, Germany **IHE, Universitat-GH Siegen, Germany
***AGFAGevaert N.V, Belgium
On-Chip Offset Calibrated Logarithmic Response Image
Sensor
Kavadias, B. Dierickx and D. Scheffer
IMEC, Belgium
128 x 64 Pixels Adaptive-Integration-Time Image Sensor
Hamamoto, Y. Ino and K. Aizawa*
Dept. of Elec. Eng., Science University of Tokyo, Japan *Dept. of
Elec. Eng., University of Tokyo, Japan
Characterization of CMOS Photodiodes for Image
Application
C. Wang, I. L. Fujimori and C. G. Sodini
Department of Elec. Eng. and Computer Science, MIT, U.S.A.
Design and Simulation of a CMOS Sensor Array
J. Wang and H. L. Kwok
Dept. of Electrical and Computer Engineering, University of Victoria,
Canada
A Passive Photodiode Pixel with Memory
Melander, M. Gokstorp* and R. Forchheimer
IVP, Integrated Vision Products AB, Sweden *Photobit Corporation,
U.S.A.
Focal Plane Processing for a Fast Detection of 2D Motion
Vectors
Li and K. Aizawa
Dept. of Electrical Engineering, University of Tokyo, Japan
Fast Square-area Detection Algorithm Using Automata for VLSI
Implementation
Akita, K. Maeda, A. Kitagawa and M. Suzuki
Dept. of Electrical and Comp. Eng., Kanazawa University, Japan
Non-Linear AD Conversion, Tolerant for Pixel Offset
Errors
Dierickx
IMEC, Belgium
A CCD-CMOS Image Sensor for Ultra-High Speed Image
Capturing
Etoh, H. Mutoh* and K. Takehara
Kinki University, Japan *Link Research Corporation, Japan
The Ideal Response Curve of Colored Photodiodes
Meynants and B. Dierickx
IMEC, Belgium
3-D Wave Optical Simulation of Inner-Layer Lens Structure
Mutoh
Link Research Corporation, Japan
Novel pH Imaging Sensors Based on CCD Technology
Sawada, S. Mimura*, K. Tomita*, T. Nakanishi*, H. Tanabe*, M.
Ishida, and T. Ando**
Dept. of Electrical and Electronic Eng., Toyohashi Univ. of
Technology, Japan *HORIBA, Ltd., Japan **Research Institute of Electronics,
Japan
High Performance Schottky Photodiode Based on Polycrystalline ITO Deposited at Room Temperature
Ma and A. Nathan
Dept. of Electrical and Computer Engineering, Univ. of Waterloo,
Canada
A Study for Image Pickup over Nyquist Rate Using Digital Signal
Processing
Kimura, N. Takatsuka, T. Arano and H. Shiraki
Dept. of Systems Engineering, Faculty of Engineering, Ibaraki Univ.,
Japan
CCD and APS – Both Together to the Comet P/Wirtanen
Behnke, H. Michaelis, M. Tschentscher and S. Mottola
Institute of Planetary Exploration, German Aerospace Center, Germany
Correlation Between Leakage Current and Overlap Capacitance in a-Si:HTFTs
Nathan, D. Pereira, M. Austin
Electrical and Computer Engineering, University of Waterloo, Canada
Measurement of Substrate Impurity Fluctuation in CCD Image
Sensors
Shiraki, T. Kimura, T. Arano and N. Takatsuka
System Dept., Faculty of Engineering, Ibaraki University, Japan
A Family of High Performance TDI Image Sensors
Weale, C. Flood, M. Ledgerwood, J. G. Mihaychuk, S. Kamasz, H.
Siefken, D. Deering and G. Ingram
DALSA Inc., Canada
Technology and Performance of VGA-Format Progressive IT-CCD Imagers with Double Transfer Gate Four-Phase Pixel Structure
J. Yu and K. K. Kwon
CCD R&D Lab., System IC Group, LG Semicon Ltd., Korea
Session 5: CMOS Image Sensors (III)
Chairman P. Wong (IBM)
Analysis and Enhancement of Low-Light-Level Performance of Photodiode type CMOS Active Pixel Imagers Operated with Sub-Threshold
Reset
Pain, G. Yang, M. Ortiz, C. Wrigley, B. Hancock and T.
Cunningham
Jet Propulsion Laboratory, California Institute ofTechnology, U.S.A.
An Improved Digital CMOS Imager
B. Kwon*, K. N. Park*, D. Y. Lee*, K. J. Lee*, S. C. Jun*, C. K.
Kim*, J. W. Eom*, A. S. Choi*, Y. B. Lee* and W. Yang* **
*Image Sensor Dev. System I C R&D, Hyundai Electronics Inc, Korea
**Harvard University, U.S.A.
A Low-Light to Sunlight, 60 Frames/s, 80k Pixel CMOS APS Camera-on-a Chip With 8b Digital Output
L. Barna, L. P. Ang, B. Mansoorian and E. R. Fossum
Photobit Corp., U.S.A.
A Linear-Response, High-Dynamic Range CMOS Imager Suitable for
Spectroscopic Applications
Qian and W. Yang
Division of Engineering and Applied Sciences, Harvard University,
U.S.A.
Session 6. Non-Visible Image Sensors
Current Skimming-Based CMOS Readout Architectures for Quantum Well Infrared Photodetectors
Friedman, A. Arbel and R. Ginosar
VLSI Systems Research Center, Israel Institute ofTechnology, Israel
A Stacked CMOS APS for Charge Particle Detection and its Noise
Performance
Takayanagi, J. Nakamura, H. Yurimoto*, T. Kunihiro*, K. Nagashima*,
and K. Kosaka**
Olympus Optical Co., Ltd., Japan *Tokyo Institute of Technology, Japan
**Tokyo Technology, Inc., Japan
Charge Loss in the Channel Stop Regions of the X-ray CCD
Prigozhin, M. Pivovaroff, S.Kissel, M. Bautz and G. Ricker
Center for Space Research, MIT, U.S.A.
A Partially Overlapped X-ray Imaging Pixel with Low Leakage and High
Sensitivity
Park and A. Nathan
Electrical and Computer Engineering Dept., University of Waterloo,
Canada
A Model for Object Detectability Close to Defective Columns in X-Ray
Imaging WITHDRAWN
Dyck and M. Sayag;
Lockheed Martin Fairchild Systems, U S.A.
Session 7. Large Format Image Sensors
Chairman R.
Bredthauer (Semiconductor Tech. Associates)
Kuroda (MEC)
Performance Characteristics of a 9216 x 9216 Pixel CCD
Wen, R. Bredthauer, P . Bates, P. Vu and R. Potter
Lockheed Martin Fairchild Systems, U.S.A.
An 8M-CCD for an Ultra High Definition TV Camera
Smith, M. Farrier, K. Mitani*, Q. Tang and G. Ingram
DALSA Inc., Canada *NHK, Japan
Large Format CCD Image Sensors Fabricated on High Resistivity
Silicon
E.Holland, D. E. Groom, M. E. Levi, N. P. Palaio, S. Perlmutter, R.
J. Stover* and M. Wei*
Lawrence Berkeley National Laboratory, University of California,
U.S.A. *Lick Observatory, University of California Observatories, U.S.A.
A Page Width CMOS Image Sensor Array J.Tandon Xerox
Corporation, U.S.A
Session 8. CMOS Image Sensors (IV) and Image Sensor Characterization
Chairman O. Yadid-Pecht (Ben-Gurion Univ. of Negav)
Tanioka (NHK)
First Multispectral Diode Color Imager with Three Color Recognition and
Color Memory in Each Pixel
Sommer*, P. Rieve*, M. Verhoeven*, M. Bohm* **, B. Schneider**, B.
van. Uffel*** and F. Librecht***
*Silicon Vision GmbH, Germany **IHE, Universitat-GH Siegen, Germany
***Agfa-Gevaert N.V., Belgium
Self-Calibrating Logarithmic CMOS Image Sensor with Single Chip Camera
Functionality
Loose, K. Meier and J. Schemmel
IHEP, Heidelberg University, Germany 4:45
A Novel CMOS-APS Configuration with an Extremely Low Fixed Pattern
Noise
I. Watanabe
Corporate Research Labs., Fuji Xerox Co., Ltd., Japan
CCD Requirements for Digital Photography
L. Baer
Hewlett-Packard Laboratories, U.S.A. 5:35
Test Methodologies for Digital CMOS Camera-on-a-Chip Image
Sensors
Waligorski, M. B. Kaplinsky, V Berezin and E. R. Fossum
Photobit Corporation, U.S.A.
Session 9. Discussion Session
Chairman E. Fossum (Photobit)
Saturday, June 12
Session 10. Walter Kosonocky Award
Chairman Albert Theuwissen
(Philips)
Walter Kosonocky
Award Presentation
Session 11. CMOS Image Sensors (V)
Area Auto Focus CMOS Sensor
Takahashi, T. Ezaki, M. Shinohara, S. Furudate, H. Nakamura, T.
Ichise, and S. Sugawa
Device Development Center, Canon Inc., Japan
On Chip Focal Plane Filtering for CMOS Imagers
Huppertz, T. Kneip, M. Schwarz and B. J. Hosticka
Fraunhofer Institute ofMicroelectronic Circuits and Systems, Germany
CMOS Image Sensor Overlaid with a HARP Photoconversion
Layer
Watabe, H. Ohtake, K. Yamano, M. Yamauchi, T. Tajima, Y. Takiguchi,
Y. Ishiguro, T. Hayashida M. Kosugi, H. Kokubun, T. Watanabe and M.
Abe
NHK Science and Technical Research Laboratories, Japan
LARS II -A High Dynamic Range Image Sensor with a-Si:H Photo Conversion Layer
Lule*, H. Keller*, M. Wagner* and M. Bohm* **
*Silicon Vision GmbH, Germany **IHE, Universitat-GH Siegen, Germany
Session 12. CCD Image Sensors
(II) Chairman K. Yonemoto (Sony)
Mutoh (NEC)
Performance of FT-CCD Image Sensor with Single Layer Poly-Silicon
Electrode
Y Okada, Y Ohtsuru, S. Izawa, N. Taino and M.
Hamada CCD Development Dept., MOS-LSI Division, SANYO Electric Corp., Japan
Evaluation of Subsampling in a 2/3″ 2-M Pixel FT-CCD
T. Bosiers, A. C. Kleimann, M. Horemans and L. L. Cam
Philips Semiconductors Image Sensors, The Netherlands
Technology to Eliminate Yield-Limiting Elements in CCD
Imagers
Peek, D. Verbugt, H. Stoldt and A. D. Veirman
Philips Semiconductors Image Sensors, The Netherlands
1/2″ 2Mpixel Full Frame CCD Sensor for Digital
Photography
Pektas, J. Toker and S. Bencuya
Image Sensor Technology Division, Polaroid Corporation, U.S.A.
A 1/4-inch 630k-pixel IT-CCD Image Sensor with High-Speed Capture
Capability
Kimura, H. Yoshida, I. Hirota, A. Yamamoto, K. Ezoe, Y
Okazaki,
Takamura, H. Mori* and Y Fujita*
Semiconductor Company, SONY Corporation, Japan *SONY Kokubu
Corporation, Japan