WORKSHOP PAPER
Quantum C100, a Wafer Scale CMOS Detector Optimised for 100 keV Cryo-Electron Microscopy
El Guerrini1, Mohamed Barnard2, Sharkawy3, Nicola Matthew Hart1, Craig Macwaters1, Roger Goldsbrough2, Angus Kirkland3, Liam O'Ryan2, Herman Larsen1, Iain Sedgwick1, Sam W. Hutchings1
1Science and Technology Facilities Council, Rutherford Appleton Laboratory, OX11 0QX, Didcot, UK, Tel 0044 1235 446212, email: nicola.guerrini@stfc.ac.uk
2Quantum Detectors Ltd, Rutherford Appleton Laboratory, OX11 0QX, Didcot, UK,
3Rosalind Franklin Institute, Rutherford Appleton Laboratory, OX11 0QX, Didcot, UK,

Abstract

Wafer scale CMOS image sensors are no longer a rarity, thanks to the adoption and the improvement of stitched manufacturing techniques. In this paper, in fact, we do not intend to focus on the sensor area, which is dictated by the application needs. What we want to showcase are the sensor performance relatively to the technology node used and its importance in the field the sensor has been designed for, cryo-electron microscopy (cryo-EM) at 100keV.
Year: 2025
Workshop: IISW
URL: https://doi.org/10.60928/2r0e-093n
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Keywords

CMOS, wafer scale, cryo-electron microscopy,

References

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