WORKSHOP PAPER
Plasmonic diffraction for the sensitivity enhancement of silicon image sensor
Abstract
The abstract of the document is not explicitly mentioned, but a summary can be generated based on the text provided. This work focuses on enhancing the Near-infrared (NIR) sensitivity of silicon-based image sensors without resorting to thick silicon layers, which degrade image quality due to pixel crosstalk. The study suggests using plasmonic diffraction, specifically through a multiple pyramid shape surface of silicon sensitive layer and metal gratings combined with highly reflective Deep Trench Isolation (DTI), to increase the effective silicon thickness and light propagation length, thereby improving NIR sensitivity. The findings underscore the potential of plasmonic enhancement in silicon image sensors, detailing the research conducted, the simulated performance improvements, and the overall significance of these advancements in NIR sensing technology.Keywords
Plasmonic diffraction, NIR sensitivity, Silicon image sensor,References
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