WORKSHOP PAPER
Backside-Illuminated 4-T Pinned Avalanche Photodiode Pixel for Readout Noise-Limited Applications
Tomislav Resetar1,2, Koen De Munck2, Luc Haspeslagh2, Piet De Moor2, Paul Goetschalckx2, Robert Puers1,2, Chris Van Hoof1,2
1KU Leuven, ESAT, 3001 Leuven, Belgium
2IMEC, 3001 Leuven, Belgium

Abstract

A novel pixel concept utilizing a backside-illuminated pinned avalanche photodiode (PAPD) manufactured in 130 nm minimally modified CMOS and operated by a standard four-transistor CMOS Image Sensor (CIS) readout is presented. This concept explores the possibility to increase the SNR by avalanche amplification in the low-light regime for applications that are limited by higher readout noise levels, e.g. high speed and global shutter. Customized avalanche junction implants were optimized and full pixel operation including pinning, light integration and charge transfer at -40 V substrate bias for a multiplication factor of 2–4 was simulated in 2D TCAD. Test arrays of 8x32 pixels with 5 and 10 µm pitch and fully-isolated on-chip CMOS readout were designed. Preliminary experimental results of avalanche and punch-through breakdowns on test-diodes show good agreement with TCAD simulations.
Publisher: IISS (Int. Image Sensors Society)
Year: 2015
Workshop: IISW
URL: https://doi.org/10.60928/u6xp-leii

Keywords

Backside-Illuminated, Pinned Avalanche Photodiode, Readout Noise,

References

1) E. R. Fossum and D. B. Hondongwa, "A review of the pinned photodiode for CCD and CMOS image sensors", IEEE J. Elec. Dev. Soc, 2014. https://doi.org/10.1109/jeds.2014.2306412
2) G. Meynants, "Global shutter imagers for industrial applications", International Society for Optics and Photonics, 2014, p. 914108., 2014. https://doi.org/10.1117/12.2060072
3) Y. Zhou, Z. Cao, Q. Qin, Q. Li, C. Shi, and N. Wu, "A high speed 1000 fps CMOS image sensor with low noise global shutter pixels", Science China Information Sciences, vol. 57, no. 4, pp. 1–8, 2014. https://doi.org/10.1007/s11432-013-4889-3
4) R. McIntyre, "Multiplication noise in uniform avalanche diodes", Electron Devices, IEEE Transactions on, vol. 13, no. 1, pp. 164–168, 1966. https://doi.org/10.1109/t-ed.1966.15651
5) H. H. Barrett and K. J. Myers, "Foundations of Image Science", New York: Wiley, 2003. https://doi.org/10.1118/1.1677252
6) A. I. Biber, "Avalanche photodiode image sensing in standard silicon BiCMOS technology", Ph.D. dissertation, Eidgenössische Technische Hochschule (ETH), Zürich, 2000., 2000. https://doi.org/10.1109/16.877191
7) K. De Munck and T. Resetar, "Pinned photodiode (PPD) pixel architecture with separate avalanche region", U.S. Patent Application 20 140 374 867A1, Dec. 25, 2014., 2014
8) S. L. Miller, "Avalanche breakdown in germanium", Physical review, vol. 99, no. 4, p. 1234, 1955. https://doi.org/10.1103/physrev.99.1234