WORKSHOP PAPER
Airgrid with near-ideal structure for enhanced performance and reliability
Xing Chen1, Kun Li1, Jeremiah Hebding1, Vinayak Rastogi1, Zhen Xu1, Doug Lee1, Yubin Zhang1, Charisse Zhao1, El Mehdi Bazizi1, Man-Ping Cai1, Haim Pearl1, Shimon Levi1, Michael Chudzik1
1Applied Materials Inc., 3050 Bowers Ave, Santa Clara, California, 95054, USA

Abstract

CMOS Image Sensor pixel scaling beyond 0.7um presents significant challenges in maintaining optical performance at the per pixel level. An airgrid structure has been proposed and released in limited products to address this challenge. However, current solutions still lack key structural features that can maximize performance and reliability. Applied Materials™ has developed a new design and process integration method to create a near-ideal structure that is optimized for maximum performance and reliability requirements.
Year: 2025
Workshop: IISW
URL: https://doi.org/10.60928/xoz9-9sj0
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Keywords

CMOS Image Sensor, airgrid structure, performance, reliability,

References

[1]) P. Sungbong, et al, "A 64Mpixel CMOS Image Sensor with 0.56μm Unit Pixels Separated by Front Deep-Trench Isolation", ISSCC 2022, Session 5. https://doi.org/10.1109/isscc42614.2022.9731750