2015 INTERNATIONAL IMAGE SENSOR WORKSHOP
Monday, June 8th 2015- AM
Introductory paper:
The State-of-the-Art of Mainstream CMOS Image Sensors Ray Fontaine Competitive Technical Intelligence Group, Chipworks, Inc., Canada
Session 01 Image Sensors for Digital Photography
Session Chair: Eric Stevens
Back-side illuminated 28M-pixel APS-C sensor with high performance
Sungsoo
Choi, Seung Hyun Lim, Moosup Lim, Hyung Jin Bae, Kyo Jin Choo, Jung Hoon Park,
Kang Sun Lee, Seung Sik Kim, Jungho Moon, Kyungmok Son, Eun Sub Shim, Hankook
Cho, Yitae Kim, Seog Heon Ham,JungChak Ahn, Chang Rok Moon and Duckhyung
Lee
Samsung Electronics, System LSI Division , Gyeonggi-city, Gyeonggi-do,
Korea
A Low Noise and High Sensitivity Image Sensor with Imaging and
Phase-Difference Detection AF in All Pixels
M.Kobayashi,
M.Johnson, Y.Wada, H.Tsuboi, J.Iwata, T.Ono, H.Takada, K.Togo, Y.Arishima,
T.Kishi, A.Okita, H.Takahashi, T.Ichikawa
Canon Inc., Japan
A 4M pixel full-PDAF CMOS image sensor with 1.58μm 2X1 On-Chip
Micro-Split-Lens technology
Sozo Yokogawa1, Isao Hirota1, Isao Ohdaira1, Masao Matsumura1, Atsushi Morimitsu1, Hiroaki Takahashi1 Toshio Yamazaki2, Hideki Oyaizu2,Yalcin Incesu3, Muhammad Atif3, Yoshikazu Nitta1
1 Sony Corporation, Atsugi, Kanagawa, Japan 2 Sony Corporation, Osaki, Shinagawa-ku, Tokyo, Japan 3 Sony Deutschland GmbH, Stuttgart, Germany
Recent developments on large-area CCDs for professional applications
Jan Bosiers, Erik-Jan Manoury, Wilco Klaassens, Holger Stoldt, René Leenen,
Harry van Kuijk, Herman Peek, Walter de Laat Teledyne DALSA Professional Imaging High-Tech Campus 27, 5656AE Eindhoven, The Netherlands
Session 02 Stacked Image Sensors
Session Chair : Vladimir Koifman
Stack Chip Technology: A New Direction for CMOS Imagers V.C. Venezia, H. Rhodes, C. Shih, W.Z. Yang, and B. Zhang OmniVision Technologies, Santa Clara, USA
A 3D stacked CMOS image sensor with 16Mpixel global-shutter mode using 4
million interconnections
Toru Kondo, Yoshiaki Takemoto, Kenji Kobayashi, Mitsuhiro Tsukimura, Naohiro
Takazawa, Hideki Kato, Shunsuke Suzuki, Jun Aoki, Haruhisa Saito, Yuichi Gomi,
Seisuke Matsuda and Yoshitaka Tadaki
Olympus Corporation Japan
A 1/1.7-inch 20Mpixel Back-illuminated Stacked CMOS Image Sensor with
parallel multiple sampling
Hayato
Wakabayashi1, Atsushi Suzuki1,Nobutaka
Shimamura1,Toshiki Kainuma1, Kensuke Koiso3,
Atsushi Masagaki1, Yoichi Yagasaki1, Shigeru
Gonoi2, Masatoshi Mizuno2, Tatsuya
Sugioka1,Takafumi Morikawa1, Yoshiaki Inada1
1Sony, Atsugi, Japan, 2Sony LSI Design, Atsugi, Japan,
3Sony Semiconductor, Kumamoto, Japan
A Three-Dimensional Integration Technology with Embedded Au Electrodes for
stacked CMOS Image Sensors
Masahide Goto1, Kei Hagiwara1, Yoshinori
Iguchi1, Hiroshi Ohtake1, Takuya
Saraya2,Masaharu Kobayashi2, Eiji Higurashi2,
Hiroshi Toshiyoshi2,Toshiro Hiramoto2
1 NHK Science and Technology Research Laboratories, Tokyo, Japan, 2 The University of Tokyo, Tokyo, Japan
Session 03 Imaging Devices, Characterization and Modeling
Session Chair: Vyshnavi Suntharalingam
Detection and Shielding of Photon Emission in Stacked CIS
Calvin Chao, Chin-Hao Chang, Manoj Mhala, Hon-Yih Tu,Shang-Fu Yeh,Kuo-Yu
Chou, Po-Sheng Chou, Charles Liu, and Fu-Lung Hsueh
Taiwan Semiconductor Manufacturing Company, Hsinchu, Taiwan (Slides)
The source decomposition of Dark FPN and its improvement by Stacked CIS
process
Yamashita, W.H. Wu, W.J. Chiang, C.H. Chung, R.J. Lin, J.J. Sze, J.C. Liu,
C.H. Tseng, H. Sumiand S.G. Wuu
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, Taiwan
Interface State Generation by Substrate Injection Through the Transfer Gate
Chris Hong1, Rick Jerome1, David Price1,
Verne Hornback1, Kyle Thomas2, Rusty Winzenread2
1 ON Semiconductor, Gresham, OR, USA 2 ON Semiconductor, Santa Clara, CA, USA
Absolute Pinning Voltage Measurement: Comparison between In-pixel and JFET
Extraction Methods
Pelamatti1, V. Goiffon1, A. De Ipanema1, P.
Magnan1, C. Virmontois2 O. Saint-Pe3, M.
Breart de Boisanger3
1
ISAE Toulouse 2CNES, Toulouse, 3Airbus Defence and
Space, Toulouse, France
Fully Depleted SOI Pixel Photo Detectors with Backgate Surface Potential
Pinning
Hiroki Kamehama1, Shoji Kawahito1, Sumeet
Shrestha1, Keita Yasutomi1, Keiichiro
Kagawa1,Aayaki Takeda2,Takeshi Go Tsuru2,and
Yasuo Arai3
1Research Institute of Electronics, Shizuoka University, Hamamatsu, Japan 2Department of Physics, Kyoto University, Sakyo, Japan 3National High Energy Accelerator Research Organization, Ibaraki Japan
Session 04 Spectral Imaging and Microlenses
Session Chair: Yitae Kim
Two Layer Image Sensor Pixel Concept for Enhanced Low Light Color Imaging
Leo Anzagira, Eric R. Fossum Thayer Engineering School, Dartmouth College, Hanover, NH, USA
New Color Filter Patterns and Demosaic for Sub-micron Pixel Arrays
Biay-Cheng Hseih1, Hasib Siddiqui1,
Jiafu
Luo1, Todor Gerogiev1, Kalin Atanassov1,
Sergio Goma1, and HY Cheng2, JJ Sze2, RJ
Lin2, HY Chou2, Calvin Chao 2, SG Wuu2
1Qualcomm Inc., San Diego,CA,USA, 2TSMC,Hsinchu, Taiwan
A
80% QE High Readout Speed 1024 Pixel Linear Photodiode Array for UV-VIS-NIR
Spectroscopy
Rihito
Kuroda1, Takahiro Akutsu1, Yasumasa Koda1,
Kenji Takubo2, Hideki Tominaga2 Ryuuta
Hirose2, Tomohiro Karasawa2 and Shigetoshi Sugawa1
1Graduate School of Engineering, Tohoku University, Japan 2Shimadzu Corporation Sendai, Miyagi, Japan
Pixel performance enhancement by integrated diffractive optics
Rochus, Xavier Rottenberg, Ingrid De Wolf, Philippe Soussan, and Piet De Moor Imec, Leuven, Belgium
Session 05 Poster Flash Presentations (Group 1)
Session Chair: Gennadiy Agranov
On Chip Optics Solution on Small Pixel CIS S/N Ratio Improvement
Chih-Ching Chang, Wu-Cheng Kuo , Ken_Wu , Yu-Kun Hsiao, JC_Hsieh. VisEra Technologies Company, Hsinchu Science Park, Taiwan
Color Filter Array Patterns Designed to Mitigate Crosstalk Effects in Small
Pixel Image Sensors
Leo Anzagira and Eric R. Fossum, Thayer Engineering School, Dartmouth College, Hanover, NH , USA
Read Noise Distribution Measurement and Modeling of CMOS Image Sensors
Boyd Fowler, Clemenz Portmann, Lele Wang and Steve Tran Google Inc., Mountain View CA 94043 USA
Twinkling Behavior in Ultra-High-Resolution CMOS Global Shutter Pixels
Tsung-Hsun Tsai, David Marchesan, Naser Faramarzpour, Matthias Sonder, Eric Fox Teledyne DALSA Inc., Waterloo, ON, Canada
Electrical Characterization Method for Two Stage Transfer Global Shutter
Pixels
Manuel Innocent ON Semiconductor, Mechelen, Belgium.
CMOS Image Sensor for Multi-Aperture Optics – A 15×9 Array sensor for low
z-height 720p camera modules with depth information
Harald Neubauer, Thomas Schweiger
Fraunhofer Institute for Integrated Circuits (IIS), Erlangen, Germany
Lens-free holographic imaging of microscopic objects using photonic
structures and CMOS imagers
Murali Jayapala, Richard Stahl, Geert Vanmeerbeeck, Andy Lambrechts IMEC, Leuven, Belgium
Design and Optimisation of Large 4T Pixel Xuezhou
Cao1, Daniel Gäbler2, Chris Lee1, Tee Pei
Ling3, Devorah Anak Jarau3, David Kho Ching
Tien3, Teo Boon Chuan3, Brendan Bold1
1,2X-FAB Semiconductor Foundries AG,1Branch Office Plymouth,
Plymouth, UK, 2Erfurt, Germany 3X-FAB Sarawak Sdn. Bhd., Sarawak, Malaysia
Investigating Transfer Gate Potential Barrier by Feed-Forward Effect
Measurement
Yang Xu1, Xiaoliang Ge1 Albert J.P. Theuwissen1,2
1Delft University of Technology, Delft, the Netherlands 2Harvest Imaging, Bree, Belgium
Analysis and Reduction of Floating Diffusion Capacitance Components of CMOS
Image Sensor for Photon-Countable Sensitivity
Fumiaki Kusuhara, Shunichi Wakashima, Satoshi Nasuno, Rihito Kuroda and
Shigetoshi Sugawa
Graduate School of Engineering, Tohoku University, Japan
A 30 fps 1920 x 1080 pixel Electron Multiplying CCD Image Sensor with
Per-Pixel Switchable Gain
Parks, S. Kosman, E. Nelson, N. Roberts, and S. Yaniga
ON Semiconductor , Rochester, USA
Superlattice-doped detectors for UV through gamma-ray imaging and spectroscopy
E. Hoenk1 , J. Hennessy1 , A. D. Jewell1 ,
A. G. Carver1 , T. J. Jones1 , S. Nikzad1, M.
McClish2 ,S. Tsur3 , G. Meynants4, J.
Sgro5
1
Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA,
USA 2
Radiation Monitoring Devices, Inc., 44 Hunt Street, Watertown, MA, USA 3 Applied Materials Inc., 9 Oppenheimer St., Rehovot, Israel 4
CMOSIS , Antwerp, Belgium 5 Alacron, Inc., Nashua, NH ,
USA
Investigation of Implantation Damage Recovery using Microwave Annealing for
High Performance Image Sensing Devices.
Masatoshi Kimura1, Tadashi Yamaguchi2 and Takashi
Kuroi1
1Technology Division, Renesas Semiconductor Manufacturing Corp., Japan 2Production Technology Development Unit, Renesas Electronics Corp., Japan
The Delamination Defect Improvement of High Transmittance Dielectric (HTD)
Film on BSI Image Sensor Manufacturing
Sung-Han Tsai, Yun-Wei Cheng, Chun-Hao Chou, Kuo-Cheng Li, Hsin-Chi Chen,
Yung-Lung Hsu
Taiwan Semiconductor Manufacturing Company, Tainan, Taiwan
Active Pixel Concepts for High-Resolution Large Area Imagers
Florian De Roose1,2, Soeren Steudely2, Pawel E.
Malinowskiy2, Kris Myny2, Adi
Xhakoni1,Georges Gielen1,2, Jan Genoey1,2,
Wim Dehaene1,2 1Department of Electrical Engineering (ESAT), KU Leuven, Belgium 2Large Area Electronics Department, IMEC, Belgium
High-density 3D interconnects Technology: The key for burst-mode very high
speed imaging?
Philippe Martin-Gonthier, Fernando Raymundo, Pierre Magnan ISAE, Toulouse, France
CMOS image sensor with pseudorandom pixel placement for jaggy reduction in
line representation
Chihiro Izaki, Junichi Akita Kanazawa University, Kanazawa, Japan (Slides)
A Dual-Mode CMOS Imager for Free-Space Optical Communication with Signal
Light Source Tracking and Background Cancellation
Chih-Hao Lin, Chih-Cheng Hsieh Department of Electrical Engineering, National Tsing Hua University, Hsinchu,
Taiwan
Imaging sparse events at high speed Gaozhan Cai, Bart Dierickx, Bert Luyssaert, Nick Witvrouwen, Gerlinde Ruttens Caeleste CVBA, Mechelen, Belgium
Tuesday, June 9th 2015
Session 06 High speed, Gated and Time-Of-Flight Imaging
Session Chair: Guy Meynants
Notes about the limits of ultra-high speed solid-state imagers
Turchetta
Rutherford Appleton Laboratory, Science and Technology Facilities Council
(STFC), Harwell Science and Innovation Campus, U.K. (Slides)
Toward 10 Gfps: Factors Limiting the Frame Rate of the BSI MCG Image Sensor
T. S. Dao1,6, T. G. Etoh1, K. Shimonomura1,
Q. Nguyen1, N. Hayashi2, Y. Kamakura3, C.
Zhang4, E. Charbon4, P. Goetschalckx5, Luc
Haspeslagh5, and P. De Moor5
1Ritsumeikan University Kusatsu Japan, 2Astrodesign Inc.,
3Osaka University, 4Technical University Delft,
5IMEC, 6Research Institute for Science and Technology,
Ritsumeikan University, Kusatsu JAPAN
A 20Mfps Global Shutter CMOS Image Sensor with Improved Sensitivity and
Power Consumption
Shigetoshi
Sugawa, Rihito Kuroda, Tohru Takeda, Fan Shao, Ken Miyauchi and Yasuhisa
Tochigi
Graduate School of Engineering, Tohoku University, Japan
Oversampled ITOF Imaging Techniques using SPAD-based Quanta Image Sensors
Neale A.W. Dutton1,2, Luca Parmesan1,2, Salvatore
Gnecchi1,2, Istvan Gyongy2, Neil Calder2,
Bruce R. Rae1, Lindsay A. Grant1, Robert K.
Henderson2
1STMicroelectronics, Imaging Division, Edinburgh, UK 2The University of Edinburgh, Edinburgh, UK
A High QE, Fast Shuttered CMOS Image Sensor with a Vertical Overflow Drain
Shutter Mechanism
Erez
Tadmor1,3 , Assaf Lahav2, Alex Fish3, Giora
Yahav1, David Cohen1
1Advanced Imaging Technologies Group, Microsoft R&D Center, Haifa, Israel 2Tower-Jazz Semiconductor Ltd. Migdal Haemek, Israel 3Faculty of Engineering, Bar-Ilan University, Ramat Gan, Israel
A multi-aperture compressive time-of-flight CMOS imager for pixelwise
coarse histogram acquisition
Futa
Mochizuki1, Keiichiro Kagawa1, Min-Woong
Seo1, Taishi Takasawa1,Keita Yasutomi1, and
Shoji Kawahito1
1Research Institute of Electronics, Shizuoka University, Hamamatsu, Japan
Keynote presentation: History of the creation of MOS vision sensor arrays and associated
topics
And what does – or should – the future hold? Peter JW Noble 2015 IISS Pioneering Achievement Award recipient.
Session 07 Poster Flash Presentations (Group 2)
Session Chair: Shoji Kawahito
Designing pixel parallel localized drivers of a 3D 1Gfps image sensor
family
Zhang1 V. T. S. Dao2, T. G. Etoh2, K.
Shimonomura2, E. Charbon1
1Delft University of Technology, the Netherlands; 2Ritsumeikan
University, Japan
A 25 Mpixel, 80fps, CMOS Imager with an In-Pixel-CDS Global Shutter Pixel
Tomas Geurts, Thomas Cools, Cedric Esquenet, Rahul Sankhe, Anilkumar
Prathipati, Mukesh Rao Engla Syam, Aniruddha Bangalore Dayalu, V. Penchala
Reddy Gaddam ON Semiconductor, Belgium
A 14-bit, 33-Mpixel, 120-fps Image Sensor with DMOS Capacitors in
90-nm/65-nm CMOS
Yasue1, K. Kitamura1, T. Watabe2, H.
Shimamoto1, T. Kosugi3, T. Watanabe3,S.
Aoyama3, M.Monoi4, Z. Wei5 and S.
Kawahito5
1NHK Science and Technical Research Laboratories, Tokyo, JAPAN,
2NHK Engineering System Inc., Japan, 3Brookman
Technology, Inc., Japan, 4Toshiba Corporation Semiconductor &
Storage Products Company, Japan, 5Shizuoka University, Japan
Piece-Wise-Linear Ramp ADC for CMOS Image Sensor and Calibration Techniques
Pastorelli1,2,3, P. Mellot1, S. Mir2,3, C.
Tubert1
1STMicroelectronics, Grenoble, France 2Université Grenoble Alpes,
TIMA, Grenoble, France 3CNRS, TIMA, Grenoble, France
A 305ns Conversion-Time, 13-bit All-Digital Column Analog-to-Digital
Converter for CMOS Image Sensors in 180nm Technology
Ha Le-Thai1, Adi Xhakoni1, Genis Chapinal2,
Manuel Innocent2, Tomas Geurts2, Georges Gielen1
1KU Leuven, ESAT-MICAS, Heverleen, Belgium 2ON Semiconductor, Mechelen, Belgium
High-Speed, High Sensitivity 25 Mega Pixel CMOS Image Sensor with Column
Parallel 12 bit Hybrid ADC Architecture
Canaan Sungkuk Hong, Krishna Palle, Toan Bao, Vivian Wang, Yuan Fong, Woonil
Choi, Kwang-Bo Cho, Roger Panicacci
ON Semiconductor, San Jose, California, USA
Preliminary Experiment for Precise and Dynamic Digital Calibration for
Two-Stage Cyclic ADC Suitable for 33-Mpixel 120-fps 8K Super Hi-Vision CMOS
Image Sensor
Toshihisa
Watabe1, Kazuya Kitamura2, Tomohiko Kosugi4,
Hiroshi Ohtake2, Hiroshi Shimamoto2, and Shoji
Kawahito3,4
1NHK Engineering System, Inc., Tokyo, Japan, 2NHK Science &
Technology Research Laboratories, Tokyo, Japan , 3Research
Institute of Electronics, Shizuoka University, Hamamatsu, Japan
4Brookman Technology Inc., Hamamatsu, Japan
Backside illuminated 84 dB global shutter image sensor
Meynants, G. Beeckman, K. Van Wichelen, T. De Ridder, M. Koch, G.Schippers,
M. Bonnifait, W. Diels, J. Bogaerts CMOSIS nv, Antwerp, Belgium
A Global Shutter sensor used in Active Gated Imaging for automotive
Assaf
Lahav1, Adi Birman1, Denis Perhest1, Amos
Fenigstein1, Yoav Grauer2, Eyal Levi2 1TowerJazz, Migdal Haemek , Israel 2BrightWay Vision TM LTD, Haifa, Israel
A Smart CMOS Sensor for Optical Touch Screen Applications
Yang NI, Yiming Zhu, Bogdan Arion New Imaging Technologies SA, Verrières le Buisson France
PTC Inspired Column Level Compression in Low Power CMOS Imagers
Bhuvan, M. Sarkar and S. Chatterjee
Department of Electrical Engineering, Indian Institute of Technology Delhi,
New Delhi, India
Linear Mode High Dynamic Range Bouncing Pixel with Single transistor
Carlos A. de Moraes Cruz1, Pablo N. A. Belmonte2,
Davies W. de Lima Monteiro2 1Department of Electronics and Computation, Universidade Federal do Amazonas,
Manaus, Brazil. 2Department of Electrical Engineering, Universidade
Federal de Minas Gerais, Belo Horizonte, Brazil.
Four Concepts for Synchronous, PSN limited, true CDS, HDR imaging
A.K.Kalgi, B.Dierickx, B.Dupont, P.Coppejans, P.Gao, B.Spinnewyn, B.Luyssaert, A.
Defernez, J. Zhu, J.Basteleus, Q. Yao, W. Verbruggen, D. Uwaerts, B. Uwaerts,
G. Ruttens, G. Cai
Caeleste CVBA, Mechelen, Belgium
Spatiotemporally Varying Exposure Imaging for High Quality Image
Reconstruction
Hidenori Tabata, Tomohiro Yamazaki, Toshinori Otaka and Takayuki Hamamoto Tokyo University of Science, Tokyo , Japan
A single-exposure linear HDR 17-bit hybrid 50μm analogue-digital pixel in 90nm BSI Jeffrey M. Raynor1, Andrew Scott1,2, Christopher
Holyoake1,3, Donald S. Reay2 1STMicroelectronics, Imaging Division, 33 Pinkhill, Edinburgh, UK 2School of Engineering & Physical Sciences, Heriot-Watt University,
Edinburgh, UK 3School of Engineering & Electronics, The University of Edinburgh,
Edinburgh, UK
Time-resolved imaging device with high-speed modulators for fluorescence
lifetime measurement system
Min-Woong Seo, Keiichiro Kagawa, Keita Yasutomi, Nobukazu Teranishi,and Shoji
Kawahito
Research Institute of Electronics, Shizuoka University, Hamamatsu, Japan
Compact time-gated analog counting SPAD-based pixels for high resolution,
single-photon, time-resolved imagers
L.Gasparini1, N.Massari1, M.Perenzoni1,
L.Pancheri2, D.Stoppa1 1Fondazione Bruno Kessler, Trento, Italy , 2University of
Trento,Trento, Italy
A 15um CAPD Time-of-Flight pixel with 80% modulation contrast at 100MHz
Daniel Van Nieuwenhove,Kyriaki Fotopoulou, Camilo Ernesto Medina López, Ward
van der Tempel
SoftKinetic, Brussels, Belgium
Optimization of pulse-modulation based ToF imaging systems
Andreas Süss1,2, Yenn Leng Tanz3, Maarten
Rosmeulen2, Bedrich J. Hosticka1,3 1Fraunhofer IMS, Duisburg, Germany 2IMEC, Leuven, Belgium,
3University Duisburg-Essen, Germany
Wednesday, June 10th 2015
Session 8 Non Visible Imaging
Session Chair: Inge Peters
Invited presentation: Infrared Imagers State-Of-Art
Mazaleirat Sofradir, France
Silicon and III-N UV Photon Counting Detectors Shouleh
Nikzad, John J. Hennessy, Michael E. Hoenk, April D. Jewel, Alex G. Carver,
Timothy M. Goodsall, Todd J. Jones, Erika Hamden, and L.Douglas Bell Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA,
USA
Flexible X-ray detector with high sensitivity using low cost,
solution-processed organic photodiodes
Abhishek Kumar1, Date Moet1, Jan-Laurens van der
Steen1, Albert van Breemen1, Santosh
Shanmugam1, Arjan Langen1, ,Jan Gilot1, Pim
Groen1, Ronn Andriessen1, Matthias Simon2,
Walter Ruetten2, Alexander Douglas2, Rob
Raaijmakers3, Pawel E. Malinowski4, Kris Myny4
and Gerwin H.Gelinck5
1Holst Centre/TNO, Eindhoven, The Netherlands, 2 Philips Research,
Eindhoven, The Netherlands, 3 Philips Healthcare, PC Best, The
Netherlands, 4IMEC, Department of Large Area Electronics, Leuven,
Belgium,5Applied Physics Department, TU Eindhoven, The
Netherlands
PixFEL
project: hybrid High Dynamic Range X-ray image sensor for application at
future FEL facilities
Lucio Pancheri 1,2, Mohamed El Amine Benkechkache1,
Roberto Mendicino1,2, Hesong Xu1,2, Gian-Franco Dalla
Betta1,2, Giovanni Verzellesi3,2, Daniele
Comotti4,5, Lodovico Ratti4,5, Marco
Grassi4,5, Luca Lodola4,5, Piero
Malcovati4,5, Carla Vacchi4,5, Lorenzo
Fabris4,5, Massimo Manghisoni6,5, Valerio
Re6,5, Gianluca Traversi6,5, Giovanni
Batignani7,8, Stefano Bettarini7,8, Giulia
Casarosa7,8, Francesco Forti7,8, Antonio
Paladino7,8, Eugenio Paoloni7,8, Giuliana
Rizzo7,8, Fabio Morsani8
1Dip. di Ingegneria Industriale (DII), Università di Trento, Italy. 2TIFPA-INFN, Trento, Italy. 3DISMI, Università di Modena e Reggio, Italy. 4Dipartimento di Ingegneria Industriale e dell’Informazione, Università di
Pavia, Italy. 5INFN Sezione di Pavia, Pavia, Italy. 6Dip. di Ingegneria e Scienze Applicate, Università di Bergamo, Dalmine (BG)
Italy. 7Dip. di Fisica, Università di Pisa, Pisa, Italy. 8INFN Sezione di
Pisa, Pisa, Italy.
Monolithic Active Pixel Sensor Development for the Upgrade of the Inner
Tracking System of the ALICE Experiment at CERN
Aglieri1, C. Cavicchioli1, N. Chanlek3, A.
Collu4, C. Gao11, H. Hillemanns1, A.
Junique1, M. Kofarago1,5, M. Keil1, T.
Kugathasan1, D. Kim6, J. Kim7, A.
Lattuca8, C. A. Marin Tobon1, D. Marras4, M.
Mager1, P. Martinengo1, G. Mazza8, H.
Mugnier2, L. Musa1, C. Puggionid, J. Rousset2,
F. Reidt1,9, P. Riedler1, W. Snoeys1, S.
Siddhanta4, G. Usai4, J. W. van Hoorne1,10, P.
Yang11, J. Yi7
1CERN, 1210 Geneva 23, Switzerland 2MIND, Archamps,
France 3Suranaree, University of Technology, Nakhon Ratchasima,
Thailand 4University of Cagliari and INFN, Cagliari, Italy
5University of Utrecht, Utrecht, Netherlands 6Dongguk
and Yonsei University, Seoul, Korea 7Pusan National University,
Busan, Korea 8University of Torino and INFN, Torino, Italy
9Ruprecht–‐Karls–‐Universitat Heidelberg, Heidelberg, Germany
10Technische Universitat Wien, Vienna, Austria
11Central China Normal University, Wuhan, China
Session 09 Innovative Photon Counting
Session Chair: David Stoppa
Bit-plane Processing Techniques for Low-Light, High Speed Imaging with a
SPAD-based QIS
Istvan
Gyongy1, Neale Dutton2, Luca Parmesan1, Amy
Davies3, Rebecca Saleeb3, Rory Duncan3, Colin
Rickman3, Paul Dalgarno3, Robert K. Henderson1
1The University of Edinburgh, Edinburgh, U.K. 2STMicroelectronics Imaging Division, , Edinburgh 3Heriot-Watt University, Institute of Biological Chemistry, Biophysics and
Bioengineering, Edinburgh, U.K. (Slides)
A 2.5pJ/b Readout Circuit for 1000fps Single-bit Quanta Image Sensor
Saleh Masoodian, Arun Rao, Jiaju Ma, Kofi Odame and Eric R. Fossum Thayer School of Engineering, Dartmouth College, Hanover, NH, USA (Slides)
Multi-Bit Quanta Image Sensors Eric R. Fossum, Thayer School of Engineering at Dartmouth, Hanover, NH, USA (Slides)
A 256×256 SPAD array with in-pixel Time to Amplitude Conversion for
Fluorescence Lifetime Imaging Microscopy
Luca Parmesan1,2, Neale A.W. Dutton1,2, Neil
Calder1,
Nikola Krstajić1, Andrew J. Holmes2, Lindsay A.
Grant2, Robert K. Henderson1
1The University of Edinburgh, Edinburgh, UK 2STMicroelectronics, Imaging Division, Edinburgh UK
A high-resolution single-photon camera based on superconducting single
photon detector arrays and compressive sensing
Thomas Gerrits1, Shane Allman1, Daniel J.
Lum2, Varun Verma1, John Howell2, Rich
Mirin1, Sae Woo Nam1
1National Institute of Standards and Technology, Boulder, USA 2University of Rochester, Department of Physics and Astronomy, NY, USA
Session 10 Specialty Image Sensors
Session Chair: Shouleh Nikzad
Introductory paper: Scientific, Back Illuminated CCD development for the Transiting Exoplanet
Survey Satellite
Vyshnavi Suntharalingam, MIT Lincoln Lab, USA
CMOS Charge Transfer TDI With Front Side Enhanced Quantum Efficiency
Mayer, S. Pesenti, F. Barbier, H. Bugnet, J. Endicott, F. Devriere, T.
Ligozat e2v semiconductors, Saint Egrève, France
A CMOS Image Sensor with 240μV/e- Conversion Gain, 200ke- Full Well Capacity and 190-1000nm Spectral
Response
Satoshi Nasuno, Shunichi Wakashima, Fumiaki Kusuhara, Rihito Kuroda,
Shigetoshi Sugawa
Graduate School of Engineering, Tohoku University, Japan
A 2MP Oversampling Image Sensor with 2.75μs Row Time and Conditional Threshold Comparison Thomas Vogelsan1, Michael Guidash1, Craig
Smith1, Jay Endsley1, Loc Truong2 and Rami
Yassine2
1
Rambus Inc., Sunnyvale, CA, USA ; 2 Forza Silicon Inc., Pasadena,
CA, USA (Slides)
A 4M,1.4e-noise, 96dB dynamic range, back-side illuminated CMOS image
sensor
Xinyang Wang 1,2, Cheng Ma1,2
1Gpixel Inc., ChangChun, China, 2ChangChun Institute of Optics,
Fine Mechanics and Physics, CAS, Changchun, China
Toward Multi-MGy / Grad Radiation Hardened CMOS Image Sensors for Nuclear
Applications
Goiffon1, F. Corbière1, S. Rolando1, M.
Estribeau1, P. Magnan1, B. Avon1, J.
Baer1, M. Gaillardin2, P. Paillet2, S.
Girard3, R. Molina1, A. Chabane1, C.
Marcandella2
1ISAE, Toulouse, France / 2CEA, DAM, DIF, France /
3Université de Saint-Etienne, Laboratoire Hubert Curien, UMR-CNRS
France
Session 11 Charge Multiplication Devices and Image Sensors
Session Chair: Lindsay Grant
Electron Multiplying Device Made on a 180 nm Standard CMOS Imaging
Technology
Pierre Fereyre1, Frédéric Mayer1, Clément
Buton2, Timothée Brugière2, Mathieu
Fournier1,3, Rémi Barbier2
1e2v, France 2CNRS/IN2P3, Institut de Physique Nucléaire de Lyon, France
3Lyon University, France
Backside-Illuminated 4-T Pinned Avalanche Photodiode Pixel for Readout
Noise-Limited Applications
Tomislav
Resetar1,2, Koen De Munck2, Luc Haspeslagh2,
Piet De Moor2, Paul Goetschalckx2, Robert Puers1,2 and Chris Van Hoof1,2
1K.U. Leuven, ESAT, Leuven, Belgium ; 2IMEC, Leuven, Belgium
A Flexible 32×32 SPAD Image Sensor with Integrated Microlenses
Sun, E. Charbona and R.Ishihara
Delft University of Technology, Delft, The Netherlands
A NIR-Sensitivity-Enhanced Single-Photon Avalanche Diode in 0.18μm CMOS Cristiano Niclass, Hiroyuki Matsubara, Mineki Soga, Mitsuhiko Ohta, Masaru
Ogawa, and Tatsuya Yamashita.
Toyota Central R&D Labs, Inc., Nagakute, Aichi, Japan
Characterization of Single-Photon Avalanche Diodes in Standard 140-nm SOI
CMOS Technology
Myung-Jae Lee, Pengfei Sun, and Edoardo Charbon
TU Deft, The Netherlands
High-Sensitivity Image Sensor with Stacked Structure comprising Crystalline
Selenium Photoconductor, Crystalline OS FET and CMOS FET
Yoshiyuki Kurokawa1, Takashi Nakagawa1, Shuhei
Maeda1, Takuro Ohmaru1, Takayuki
Ikeda1,Yasutaka Suzuki1, Naoto Yamade1,
Hidekazu Miyairi1, Shigeyuki Imura2, Kenji
Kikuchi2,Kazunori Miyakawa2, Hiroshi Ohtake2,
Misao Kubota2, Makoto Ikeda3, and Shunpei Yamazaki1
1 Semiconductor Energy Laboratory, Kanagawa, Japan 2 NHK Science and Technology Research Laboratories, Tokyo, Japan 3
Department of Electrical Engineering and Information Systems, The University
of Tokyo, Japan
Thursday, June 11th 2015
Session 12 Noise
Session Chair: Dun-Nian Yaung
Invited presentation:
An overview of state-of-the-art denoising and demosaicing techniques:
toward a unified framework for handling artifacts during image
reconstruction
Goossens , Hiep Luong, Jan Aelterman, Aleksandra Pizurica, Wilfried
Philips
Ghent University, Belgium
A low-noise, P-type, vertically-pinned and back-side illuminated pixel
structure for image sensor applications
Mamdy1,2 , F. Roy1 ,G.N. Lu2, N. Ahmed1,2
1STMicroelectronics, Crolles, France 2Institut des Nanotechnologies de Lyon (INL), Université Claude Bernard Lyon
1, Villeurbanne, France
A 0.4 e-rms Temporal Readout Noise, 7.5 μm pitch and a 66% fill factor Pixel for Low Light CMOS Image Sensors
Assim
Boukhayma1,2, Arnaud Peizerat1 and Christian Enz2
1CEA-LETI, Grenoble, France ; 2ICLAB, EPFL, Switzerland
CMOS image sensor reaching 0.34 e-RMS read noise by inversion-accumulation
cycling
Qiang Yao, Bart Dierickx, Benoit Dupont Caeleste, Mechelen, Belgium. (Slides)
Night Vision CMOS Image Sensors Pixel for SubmilliLux Light Conditions
Amos Fenigstein, Adi Birman, and Assaf Lahav
TowerJazz Semiconductor, Migdal Haaemek, Israel
Session 13 High Dynamic Range Imagers and SOC
Session Chair: Shigetoshi Sugawa
A 1280×1080 4.2μm Split-diode Pixel HDR Sensor in 110nm BSI CMOS Process Trygve
Willassen1, Johannes Solhusvik1, Robert
Johansson1,Sohrab Yaghmai1, Howard Rhodes2,
Sohei Manabe, Duli Mao2, Zhiqiang Lin2, Dajiang
Yang2, Orkun Cellek2, Eric Webster2, Siguang
Ma2, and BoweiZhang2
1OmniVision Technologies, 1Gaustadalléen 21, 0349 Oslo, Norway, 2OmniVision Technologies, Santa Clara, USA
High Performance 1.3MPix HDR Automotive Image Sensor Tarek Lulé1, Christophe Mandier1, Arnaud
Glais1, Gregory Roffet1, Roger Monteith2,
Benoit Deschamps1
1
STMicroelectronics, Imaging Division, Grenoble,France ; 2STMicroelectronics, Imaging Division, Edinburgh, UK
A 120dB DR and 5μm pixel pitch imager based on local integration time adaptation
Peizerat1, F. Guezzi1, A. Dupret1, R.
Jalby1, L. Bruno de Sa1, M. Benetti1, W.
Guicquero1, Y.Blanchard2
1CEA-LETI, Grenoble, France ; 2ESIEE, Noisy-Le-Grand, France
A 1 Megapixel HDR Image Sensor SoC with Highly Parallel Mixed-Signal
Processing
Jens Döge, Christoph Hoppe, Peter Reichel and Nico Peter Fraunhofer Institute for Integrated Circuits IIS, Design Automation Division
EAS,Dresden, Germany
Design of an RGBW Color VGA Rolling and Global Shutter Dynamic and
Active-pixel Vision Sensor
Chenghan
Li, Christian Brandli, Raphael Berner, Hongjie Liu, Minhao Yang, Shih-Chii
Liu, Tobi Delbruck
Institute of Neuroinformatics, UZH & ETHZ, Zurich, Switzerland
Automatic DR and spatial sampling rate adaptation for secure and privacy-aware ROI tracking
based on focal-plane image processing
Ricardo Carmona-Galán, Jorge Fernández-Berni, Ángel Rodríguez- Vázquez Institute of Microelectronics of Seville, Seville, Spain
Session 14 Global Shutter and ADC
Session Chair: Shung Chieh
A High Speed 1 MPix Sensor with Floating Storage Gate Pixel
Alex Krymski Luxima Technology LLC, Pasadena, CA, USA
A 1.2 MP 1/3” CMOS Image Sensor with Light Flicker Mitigation
Chris Silsby1, Sergey Velichko2, Scott
Johnson2, Yan Ping Lim1, Ray Mentzer1, Jeff
Beck1 1ON Semiconductor, Corvallis, OR, USA ; 2ON Semiconductor,
Meridian, ID, USA
700 frames/s 2 MPixel global shutter image sensor with 2 Me- full well
charge and 12 μm pixel pitch
Meynants, X. Wu, S. Vanhoogenbemt, T. De Ridder, P. De Wit, K. Ruythooren, K.
Van Esbroeck
CMOSIS, Antwerp, Belgium
A Flexible 14-bit Column-Parallel ADC Concept for Application in
Wafer-Scale X-ray CMOS Imagers
Henk
Derks, Daniel Verbugt, Laurens Korthout, Wim de Haan, Wasim Muhammad,
Pierluigi Albertini
Teledyne-DALSA Professional Imaging, Eindhoven, The Netherlands (Slides)
A Two Conversions/Sample Differential Slope Multiple Sampling ADC With
Accelerated Counter Architecture
Kazuya Kitamura1, Albert Theuwissen2,3
1NHK Science and Technical Research Laboratories, Tokyo, Japan
2Delft University of Technology, Delft, The Netherlands,
3Harvest Imaging, Bree, Belgium